In sections 12.1,12.2 we shall describe a 2-dimensional mathematical model for ion etching which was presented on February 12, 1988 by David S. Ross from Eastman Kodak Company, and is based on his papers  . In Section 12.3 several mathematical problems will be posed.
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- A Conservation Law Model for Ion Etching for Semiconductor Fabrication
- Springer New York
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