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Erschienen in:
Modeling and Simulation of Silicon Anisotropic Etching Kapitel lesen Erstes Kapitel lesen

2018 | OriginalPaper | Buchkapitel

A Micromachined Silicon Resonant Pressure Sensor

verfasst von : Junbo Wang, Deyong Chen, Bo Xie, Jian Chen, Lin Zhu, Yulan Lu

Erschienen in: Micro Electro Mechanical Systems

Verlag: Springer Singapore

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Abstract

Micromachined silicon resonant pressure sensors have been widely used in automotive industry, medical instrument, aerospace, and military fields due to their high accuracy, long-term stability, and quasi-digital output. This chapter begins with the introduction of the working principle of the resonant pressure sensors, illustrating key relationships between (1) intrinsic resonant frequency and structural parameters, (2) pressure under measurement and resonant frequency shift, and (3) device sensitivity and structural parameters. Then, two kinds of micromachined silicon resonant pressure sensors based on electromagnetic and electrostatic excitations are presented, respectively, where device design, simulation, fabrication, and packaging are discussed in details. Finally, self-temperature compensation approaches are introduced to improve the performance of the micromachined silicon resonant pressure sensors, which can therefore function in a wide temperature range.

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Vorheriges Kapitel High Temperature Silicon Pressure Sensors
Nächstes Kapitel A Micromachined Vibratory Gyroscope
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Metadaten
Titel
A Micromachined Silicon Resonant Pressure Sensor
verfasst von
Junbo Wang
Deyong Chen
Bo Xie
Jian Chen
Lin Zhu
Yulan Lu
Copyright-Jahr
2018
Verlag
Springer Singapore
Buch
Micro Electro Mechanical Systems

Print ISBN: 978-981-10-5944-5

Electronic ISBN: 978-981-10-5945-2

Copyright-Jahr: 2018

DOI
https://doi.org/10.1007/978-981-10-5945-2_15

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