A study on generation of embossed carbon nanopattern by induced microdomain alignments in PAN-based block copolymer under electric field

In this study, generation of a unique carbon nanostructure having embossed morphology was examined focusing on formation pathway under an external electric field. An ultrathin embossed carbon layer was prepared by exposing a polyacrylonitrile-based block copolymer (BCP) thin film to an electric field. A detailed investigation on formation process and window for experimental parameters such as field intensity and exposure time was performed systematically. An electric field was applied to prepared BCP thin films to induce regulated microdomain alignments, and subsequent thermal treatment produced an unprecedented carbon nanostructure having a unique morphology. Atomic force microscopy analysis showed that a critical field strength (ca. 10 V/μm) and exposure time (24 h) were required to obtain the carbon nanostructure. This article can provide important information for future studies on creation of nanopatterns with electric fields.