The investigation of carbon nitride films prepared at various arc currents by vacuum cathode arc method

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Published 6 August 2002 Published under licence by IOP Publishing Ltd
, , Citation Zhimin Zhou and Lifang Xia 2002 J. Phys. D: Appl. Phys. 35 1991 DOI 10.1088/0022-3727/35/16/313

0022-3727/35/16/1991

Abstract

The carbon nitride films have been prepared in the arc currents range of 20-60 A at the Ar/N2 atmosphere of 50/400 sccm by the vacuum cathode arc deposition method. The properties of the films were characterized by x-ray photoelectron spectroscopy, Raman spectroscopy, Fourier transform infrared spectroscopy and nanoindentation. The N concentration showed a maximum of 35 at% at 20 A and decreased gradually with the arc currents. The films below 40 A consisted of linear polymeric-like component and sp2 graphitic cluster. With the increasing of the arc current from 20 to 40 A, the ID/IG rose and the photoluminescence (PL) fell gradually, which resulted from the development of the sp2 graphitic phase and the decrease of the polymeric-like phase. As a result, the CC bonds increased and sp3CN and sp2CN decreased. Above 40 A, with the increasing of arc currents, ID/IG fell and the PL increased gradually, which reflected the decreasing of sp2 graphitic phase and the modification of C and N atoms in sp2 cluster. The CC bonds and sp3CN fell and the sp2CN rose. The nanohardness of films showed increasing tendency with the arc currents. The variation of the relative ratio and the average energy of N-containing species and C-containing species at the atmosphere would be responsible for the change in the properties of films.

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10.1088/0022-3727/35/16/313