Electrochromic Properties of Niobium Oxide Thin Films Prepared by Chemical Vapor Deposition

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© 1994 ECS - The Electrochemical Society
, , Citation Toshiro Maruyama and Tetsuya Kanagawa 1994 J. Electrochem. Soc. 141 2868 DOI 10.1149/1.2059247

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1 Department of Chemical Engineering, Faculty of Engineering, Kyoto University, Kyoto 606, Japan

Dates

  1. Received 17 March 1994
  2. Revised 26 May 1994

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Abstract

Electrochromic niobium oxide thin films were prepared by chemical vapor deposition. The source material was niobium(V) ethoxide. Amorphous niobium oxide thin films were obtained at a substrate temperature 350°C. Reduction and oxidation of the films in a buffer solution resulted in desirable changes in optical absorption. Coulometry indicated that the coloration efficiency was 160 cm2 · C−1.

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10.1149/1.2059247