Coprecipitation of Ga2 O 3 in the Liquid‐Phase Epitaxial Growth of GaP

, and

© 1972 ECS - The Electrochemical Society
, , Citation M. Kowalchik et al 1972 J. Electrochem. Soc. 119 756 DOI 10.1149/1.2404321

1945-7111/119/6/756

Abstract

Coprecipitation of has been observed in O‐doped epitaxial films grown by liquid‐phase epitaxy under isothermal conditions at an average growth temperature of ∼1040°C. The coprecipitation seems to be independent of cooling rate and of the source of O [ powder, bulk , or glassy ]. The coprecipitation of could be prevented either by imposing a temperature gradient over the ampoule (to enhance vapor transport via ) or by reducing the amount of O added to the Ga‐rich solution in an isothermal system to . The latter result is interpreted as giving the solubility at ∼1040°C of in Ga saturated with and is used to obtain an estimate of the eutectic valley in the ternary system.

Export citation and abstract BibTeX RIS

10.1149/1.2404321