Preparation and Properties of Vanadium Dioxide Films

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© 1968 ECS - The Electrochemical Society
, , Citation J. B. MacChesney et al 1968 J. Electrochem. Soc. 115 52 DOI 10.1149/1.2411002

1945-7111/115/1/52

Abstract

Phase equilibria of the vanadium‐oxygen system have been restudied in the composition range in order to establish the conditions required for stable existence of the phase. Using this knowledge, it was possible to prepare films of exhibiting transition in conductivity between semiconducting and metallic states. Films of were first prepared by vapor deposition of vanadyl trichloride at temperatures below 127°C in 1 atm of . Reduction of these to was accomplished by heating in controlled atmospheres of appropriate partial oxygen pressure at temperatures between 500° and 550°C. The resulting thin film (0.1–1.0µ) exhibited a sharp drop (greater than two orders of magnitude) in resistance at the expected transition temperature, 67 °C.

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10.1149/1.2411002