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Erschienen in: Journal of Materials Science: Materials in Electronics 2/2018

19.10.2017

Cantilever testing of sintered-silver interconnects

verfasst von: Andrew A. Wereszczak, Branndon R. Chen, Osama M. Jadaan, Brian A. Oistad, Max C. Modugno, Jeffrey W. Sharp, James R. Salvador

Erschienen in: Journal of Materials Science: Materials in Electronics | Ausgabe 2/2018

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Abstract

Cantilever testing is an underutilized test method from which results and interpretations promote greater understanding of the tensile and shear failure responses of interconnects, metallizations, or bonded joints. The use and analysis of this method were pursued through the mechanical testing of sintered-silver interconnects that joined Ni/Au-plated copper pillars or Ti/Ni/Ag-plated silicon pillars to Ag-plated direct bonded copper substrates. Sintered-silver was chosen as the interconnect test medium because of its high electrical and thermal conductivities and high-temperature capability—attractive characteristics for a candidate interconnect in power electronic components and other devices. Deep beam theory was used to improve upon the estimations of the tensile and shear stresses calculated from classical beam theory. The failure stresses of the sintered-silver interconnects were observed to be dependent on test-condition and test-material-system. The experimental simplicity of cantilever testing, and the ability to analytically calculate tensile and shear stresses at failure, result in it being an attractive mechanical test method to evaluate the failure response of interconnects.

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Fußnoten
1
Certain commercial software, materials, equipment, and their vendors or manufacturers are identified to adequately describe the experimental procedure. This does not imply their endorsement by the Oak Ridge National Laboratory, UT-Battelle, US Department of Energy, nor its employees, nor by the co-authors or their employers, nor that they are necessarily the best or only choices for these purposes.
 
2
The L/d ratios of legs or pillars in TE devices are often less than 3, so deep beam theory is relevant to the interpretation of their mechanical response.
 
3
Different drying times and temperatures are likely to be dependent on the combination of user-chosen Ag-paste, print size, underlayment, and heating apparatus. Therefore, it should not be assumed that the present study’s identified optimized drying time and temperature will apply in the case of any deviation from the Ag-paste, print size, substrate, and heating apparatus described here.
 
4
34 KPa equates to an available dead weight (2.7 N) that was used to compress the interconnect area (78 mm2), and is therefore an arbitrary chosen stress.
 
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Metadaten
Titel
Cantilever testing of sintered-silver interconnects
verfasst von
Andrew A. Wereszczak
Branndon R. Chen
Osama M. Jadaan
Brian A. Oistad
Max C. Modugno
Jeffrey W. Sharp
James R. Salvador
Publikationsdatum
19.10.2017
Verlag
Springer US
Erschienen in
Journal of Materials Science: Materials in Electronics / Ausgabe 2/2018
Print ISSN: 0957-4522
Elektronische ISSN: 1573-482X
DOI
https://doi.org/10.1007/s10854-017-8063-3

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