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Colloid and Polymer Science
Erschienen in: Colloid and Polymer Science 2/2017

30.12.2016 | Original Contribution

Combined “post-infiltration, subsequent photochemical cross-linking” and “cross-linking and selective etching” strategies to fabricate nanoporous layer-by-layer assembled multilayers

verfasst von: Heng Du, Yajun Zhang, Shanshan Lv

Erschienen in: Colloid and Polymer Science | Ausgabe 2/2017

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Abstract

This study reports a new method combining a “post-infiltration, subsequent photochemical cross-linking” strategy and a “cross-linking and selective etching” approach to fabricate porous multilayers incorporating weak polyelectrolytes poly(allylamine hydrochloride) (PAH), polyethyleneimine (PEI), and poly(sodium-p-styrenesulfonate) (PSS). The multilayer film is fabricated by layer-by-layer (LbL) assembly of a blend of PAH and PEI in alternation with PSS to construct a composite multilayer film as a precursor. Then, 4,4′-diazido-2,2′-stilbenedisulfonic acid disodium (DAS) is infiltrated into the multilayer films, and subsequent photochemical cross-linking is applied under UV irradiation. By taking advantage of the differences between PAH/PSS and PEI/PSS, the multilayer films are immersed into a basic solution to selectively dissolve PEI. UV-visible spectroscopy, atomic force microscopy and cyclic voltammogram characterization results prove formation of nanoporous structures in the LbL assembled multilayer films. This novel way to fabricate porous films is anticipated to have potential applications in polymer and interface science.
Vorheriger Artikel Thermo-responsive behavior of propynyl-containing hydroxyethyl starch
Nächster Artikel A thermo-sensitive OEGMA-based polymer: synthesis, characterization and interactions with surfactants in aqueous solutions with and without salt

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Metadaten
Titel
Combined “post-infiltration, subsequent photochemical cross-linking” and “cross-linking and selective etching” strategies to fabricate nanoporous layer-by-layer assembled multilayers
verfasst von
Heng Du
Yajun Zhang
Shanshan Lv
Publikationsdatum
30.12.2016
Verlag
Springer Berlin Heidelberg
Erschienen in
Colloid and Polymer Science / Ausgabe 2/2017
Print ISSN: 0303-402X
Elektronische ISSN: 1435-1536
DOI
https://doi.org/10.1007/s00396-016-3990-8

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