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2001 | OriginalPaper | Buchkapitel

Discussion Panel: Databases for Gaseous Dielectrics and Plasma Processing

verfasst von : J. K. Olthoff, K. Becker, A. Garscadden, J. Herron, Y. Itikawa, E. Marode

Erschienen in: Gaseous Dielectrics IX

Verlag: Springer US

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Electron collisions are the most fundamental processes in a plasma for gaseous dielectrics or plasma processing.1,2 The plasma is sustained mainly by the process of electron-impact ionization. Electron collision produces various active particles (i.e., excited species, ions, and radicals), which, in turn, induce many chemical processes of practical importance. Those inelastic collisions are also important in slowing down of the electrons accelerated by the electric field. Elastic scattering should be taken into account when we determine the distribution of electron velocity, which controls the transport processes of electrons in the plasma. Finally, electron-attaching process plays a key role in the gaseous dielectrics. Thus, in the study of gaseous dielectrics or plasma processing, it is essential to have the cross section data for such processes of electron collisions with atoms and molecules.

Metadaten
Titel
Discussion Panel: Databases for Gaseous Dielectrics and Plasma Processing
verfasst von
J. K. Olthoff
K. Becker
A. Garscadden
J. Herron
Y. Itikawa
E. Marode
Copyright-Jahr
2001
Verlag
Springer US
DOI
https://doi.org/10.1007/978-1-4615-0583-9_84

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