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Erschienen in: Journal of Materials Science: Materials in Electronics 10/2019

10.04.2019

Double-exponential current–voltage (I–V) and negative capacitance (NC) behavior of Al/(CdSe-PVA)/p-Si/Al (MPS) structure

verfasst von: A. Büyükbaş-Uluşan, A. Tataroğlu, Y. Azizian-Kalandaragh, M. Koşal

Erschienen in: Journal of Materials Science: Materials in Electronics | Ausgabe 10/2019

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Abstract

In this study, I–V and C–V characteristics of the Al/(CdSe-PVA)/p-Si/Al (MPS) structure have been investigated the by taking into account double-exponential I–V and NC behavior. The structural characterization of CdSe nanocrystals were analyzed by X-ray diffraction (XRD), scanning electron micros-copy (SEM), and energy dispersive X-ray (EDX) techniques. These results show that the prepared CdSe consists of spherical monodispersed nanocrystalites of about 200 nm; aggregated in the form of poly-dispersive nanoclusters of arbitrary shape with the size in the range of 150-300 nm and they are in good agreement with those estimated from the XRD pattern. The forward bias LnI–V plot of the MPS structure has two linear parts which are called low bias Region 1 (R1:0.25-0.65 V) and moderate bias Region 2 (R2:0.70-1.20 V). The ideality factor (n) and barrier height (BH:ΦB0) were found to be 9.38 and 0.61 eV for R1 and 6.51 and 0.65 eV for R2, respectively. The current conduction/transport mechanism (CCM/CTM) are also defined by forward I–VLn(I)–V and reverse bias In(IR)–VR1/2 plots. I–VLn(I)–V plot has also two linear parts which are also called (R1:-3.02/-0.29) and (R2:-0.10/1.60) obey I ~ Vm law. The slope (m) of them was found to be 1.63 and 4.57 which are corresponding to ohmic and trap-charge limited current (TCLC) mechanisms, respectively. Moreover, the value of ΦB(C–V) was found from the linear part of C−2-V plot as 0.79 eV which is higher than the obtained forward bias lnI–V plot due to the nature of measured method.

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Metadaten
Titel
Double-exponential current–voltage (I–V) and negative capacitance (NC) behavior of Al/(CdSe-PVA)/p-Si/Al (MPS) structure
verfasst von
A. Büyükbaş-Uluşan
A. Tataroğlu
Y. Azizian-Kalandaragh
M. Koşal
Publikationsdatum
10.04.2019
Verlag
Springer US
Erschienen in
Journal of Materials Science: Materials in Electronics / Ausgabe 10/2019
Print ISSN: 0957-4522
Elektronische ISSN: 1573-482X
DOI
https://doi.org/10.1007/s10854-019-01291-3

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