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Erschienen in:

01.06.2023

Effect of electromigration on onset of morphological instability of a nanowire

verfasst von: Mikhail Khenner

Erschienen in: Journal of Engineering Mathematics | Ausgabe 1/2023

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Abstract

Der Artikel befasst sich mit der theoretischen Untersuchung der morphologischen Stabilität und Evolution von einkristallinen Festdrähten, insbesondere mit den Auswirkungen der Elektromigration. Aufbauend auf den grundlegenden Arbeiten von Nichols und Mullins untersucht die Studie erneut die Analyse der Drahtstabilität unter dem Einfluss von Elektromigration und zeigt auf, wie dieses Phänomen Instabilitäten verstärken oder mildern kann. Die Forschung beleuchtet den Einfluss von Anisotropie und Kontaktwinkeln auf die Drahtstabilität und führt eine semi-analytische Lösung für neutrale Stabilität ein, die wertvolle Erkenntnisse über das komplexe Zusammenspiel zwischen Oberflächendiffusion und Elektromigration liefert. Die Ergebnisse haben bedeutende Auswirkungen auf die zuverlässige und skalierbare Herstellung von Nanokontakten und bieten eine neue Perspektive zur Kontrolle von Drahtbruch und Nanopartikelabständen durch angewandte elektrische Felder.

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Fußnoten
1
For wires that make a contact with the substrate, McCallum et al. [4] make the following useful observation: “...at any other contact angle (i.e. at \(\alpha \ne \pi /2\)), an axisymmetric perturbation does not preserve the contact line; it will lead either to elevation of the contact line out of the plane of the substrate, or to penetration of the contact line below the plane of the substrate. In other words, the outward normal \(\varvec{{n}}\) lies in the plane of the substrate only when \(\alpha =\pi /2\), so that an axisymmetric perturbation at this contact angle can keep the contact line in the substrate plane”.
 
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Metadaten
Titel
Effect of electromigration on onset of morphological instability of a nanowire
verfasst von
Mikhail Khenner
Publikationsdatum
01.06.2023
Verlag
Springer Netherlands
Erschienen in
Journal of Engineering Mathematics / Ausgabe 1/2023
Print ISSN: 0022-0833
Elektronische ISSN: 1573-2703
DOI
https://doi.org/10.1007/s10665-023-10271-w

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