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Shape Memory and Superelasticity
Erschienen in: Shape Memory and Superelasticity 1/2018

05.01.2018 | SPECIAL ISSUE: A TRIBUTE TO PROF. SHUICHI MIYAZAKI – FROM FUNDAMENTALS TO APPLICATIONS, INVITED PAPER

Electrochemical Properties of Si Film Electrodes Containing TiNi Thin-Film Current Collectors

verfasst von: Yeon-min Im, Jung-pil Noh, Gyu-bong Cho, Tea-hyun Nam

Erschienen in: Shape Memory and Superelasticity | Ausgabe 1/2018

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Abstract

A 50.3Ti–49.7Ni thin film fabricated by DC sputtering was employed as a current collector of Si film electrode. The structural and electrochemical properties of Si/TiNi film electrode were compared with those of a Si/Cu film electrode. The TiNi film with cluster-like structures composed of B2 austenitic phase at room temperature displayed the high electrochemical stability for Li ions. The amorphous Si film deposited on the TiNi film also consisted of cluster-like structures on the surface. The Si film grown on the TiNi film current collector (Si/TiNi electrode) demonstrated a high columbic efficiency of 87% at the first cycle (363 μAh/cm2 of charge capacity and 314 μAh/cm2 of discharge capacity). The Si/TiNi electrode exhibited better electrochemical properties in terms of capacity, cycle performance, and structural stability compared to the Si electrode with a conventional Cu foil current collector.
Vorheriger Artikel Fabrication of SLM NiTi Shape Memory Alloy via Repetitive Laser Scanning
Nächster Artikel SMA Foils for MEMS: From Material Properties to the Engineering of Microdevices

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Metadaten
Titel
Electrochemical Properties of Si Film Electrodes Containing TiNi Thin-Film Current Collectors
verfasst von
Yeon-min Im
Jung-pil Noh
Gyu-bong Cho
Tea-hyun Nam
Publikationsdatum
05.01.2018
Verlag
Springer International Publishing
Erschienen in
Shape Memory and Superelasticity / Ausgabe 1/2018
Print ISSN: 2199-384X
Elektronische ISSN: 2199-3858
DOI
https://doi.org/10.1007/s40830-017-0134-z

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