A cationic surfactant-induced selective etching strategy for the synthesis of organosilica hollow nanospheres

The simple and effective synthesis of well-defined organosilica hollow nanospheres (OHNSs) for fundamental research and practical applications is still a significant challenge. In this work, a facile “cationic surfactant-induced selective etching” strategy was developed for the fabrication of hollow thiocyanatopropyl silsesquioxanes (thiocyanatopropyl-SQ), mercaptopropyl silsesquioxane (mercaptopropyl-SQ) from cyanoethyl-SQ@thiocyanatopropyl-SQ and cyanoethyl-SQ@mercaptopropyl-SQ, respectively. The experiments demonstrated that cetyltrimethylammonium bromide (CTAB) had remarkable influence on the formation of hollow structure and could accelerate the etching process significantly. A formation mechanism initiated by the adsorption of cationic surfactant followed by the etching of inner core with NH₃·H₂O was proposed. Hollow thiocyanatopropyl-SQ and mercaptopropyl-SQ with various shell thickness could be prepared by manipulating the amount of CTAB. And large-scale OHNSs were obtained at appropriate concentration of CTAB through this strategy. Moreover, this strategy might be further extended to fabricate OHNSs with other worthy functional groups.