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29-03-2023

A performance evaluation of a novel field-effect device as an alternative to the field-effect diode

Authors: Vahid Khorsand, Reza Yousefi, Seyed Saleh Ghoreishi, Amard Afzalian

Published in: Journal of Computational Electronics | Issue 3/2023

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Abstract

This paper introduces a novel device with the same \(I-V\) characteristics as a field-effect diode (FED). The electrical characteristics such as \(I_\textrm{ON}\), \(I_\textrm{OFF}\), \(I_\textrm{ON}/I_\textrm{OFF}\) ratio, intrinsic delay (\(\tau\)), energy-delay product (EDP), and subthreshold power dissipation (SPD) are simulated at various device lengths for the proposed device using the non-equilibrium Green’s function formalism. The simulation results are compared to those of our previous work, as it has been demonstrated that the electrical characteristics of the device are superior to other reported FED designs. Considerably reduced manufacturing complexity is one of the main benefits of the new device over the conventional FED. The simulation results reveal that for a channel length of 30 nm, the proposed device shows a \(63\%\) increase in \(I_\textrm{ON}\), a \(62\%\) reduction in the EDP, a \(46\%\) reduction in \(\tau\), a 1.5 order of magnitude reduction in \(I_\textrm{OFF}\), two orders of magnitude increase in \(I_\textrm{ON}/I_\textrm{OFF}\), and a 1.5 order of magnitude decrease in SPD compared to our previous work.

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Literature
1.
go back to reference Tripathi, S.L., Mishra, R., Mishra, R.A.: Multi-gate MOSFET structures with high-k dielectric materials. J. Electron Device 16, 1388 (2012) Tripathi, S.L., Mishra, R., Mishra, R.A.: Multi-gate MOSFET structures with high-k dielectric materials. J. Electron Device 16, 1388 (2012)
2.
go back to reference Kumar, S., Kumar, K., Raj, B.: Analysis of double gate dual material tunnel FET device for low power SRAM cell design. Quantum Matter 5(6), 762 (2016)CrossRef Kumar, S., Kumar, K., Raj, B.: Analysis of double gate dual material tunnel FET device for low power SRAM cell design. Quantum Matter 5(6), 762 (2016)CrossRef
3.
go back to reference Tripathi, S.L., Patel, G.S.: Design of low power Si\(^{0.7}\)Ge\(^{0.3}\) pocket junction-less tunnel FET using below 5 nm technology. Wirel. Pers. Commun. 111(4), 2167 (2020)CrossRef Tripathi, S.L., Patel, G.S.: Design of low power Si\(^{0.7}\)Ge\(^{0.3}\) pocket junction-less tunnel FET using below 5 nm technology. Wirel. Pers. Commun. 111(4), 2167 (2020)CrossRef
4.
go back to reference Nowbahari, A., Roy, A., Marchetti, L.: Junctionless transistors: state-of-the-art electronics. Electronics 9(7), 1174 (2020)CrossRef Nowbahari, A., Roy, A., Marchetti, L.: Junctionless transistors: state-of-the-art electronics. Electronics 9(7), 1174 (2020)CrossRef
5.
go back to reference Cao, Q.: Carbon nanotube transistor technology for More-Moore scaling. Nano Res. 14(9), 3051 (2021)CrossRef Cao, Q.: Carbon nanotube transistor technology for More-Moore scaling. Nano Res. 14(9), 3051 (2021)CrossRef
6.
7.
go back to reference Pon, A., Bhattacharyya, A., Rathinam, R.: Recent developments in black phosphorous transistors: a review. J. Electron. Mater. 50(11), 6020 (2021)CrossRef Pon, A., Bhattacharyya, A., Rathinam, R.: Recent developments in black phosphorous transistors: a review. J. Electron. Mater. 50(11), 6020 (2021)CrossRef
8.
go back to reference Hammam, A.M., Schmidt, M.E., Muruganathan, M., Suzuki, S., Mizuta, H.: Sub-10 nm graphene nano-ribbon tunnel field-effect transistor. Carbon 26, 588 (2018)CrossRef Hammam, A.M., Schmidt, M.E., Muruganathan, M., Suzuki, S., Mizuta, H.: Sub-10 nm graphene nano-ribbon tunnel field-effect transistor. Carbon 26, 588 (2018)CrossRef
9.
go back to reference Raissi, F.: A brief analysis of the field effect diode and breakdown transistor. IEEE Trans. Electron Devices 43(2), 362 (1996)CrossRef Raissi, F.: A brief analysis of the field effect diode and breakdown transistor. IEEE Trans. Electron Devices 43(2), 362 (1996)CrossRef
10.
go back to reference Tripathy, M.R., Singh, A.K., Samad, A., Chander, S., Baral, K., Singh, P.K., Jit, S.: Device and circuit-level assessment of GaSb/Si heterojunction vertical tunnel-FET for low-power applications. IEEE Trans. Electron Devices 67(3), 1285 (2020)CrossRef Tripathy, M.R., Singh, A.K., Samad, A., Chander, S., Baral, K., Singh, P.K., Jit, S.: Device and circuit-level assessment of GaSb/Si heterojunction vertical tunnel-FET for low-power applications. IEEE Trans. Electron Devices 67(3), 1285 (2020)CrossRef
11.
go back to reference Patel, R., Agrawal, Y., Parekh, R.: Single-electron transistor: review in perspective of theory, modelling, design and fabrication. IMicrosyst. Technol. 27(5), 1863 (2021)CrossRef Patel, R., Agrawal, Y., Parekh, R.: Single-electron transistor: review in perspective of theory, modelling, design and fabrication. IMicrosyst. Technol. 27(5), 1863 (2021)CrossRef
12.
go back to reference Manavizadeh, N., Raissi, F., Soleimani, E.A., Pourfath, M., Selberherr, S.: Performance assessment of nanoscale field-effect diodes. IEEE Trans. Electron Devices 58(8), 2378 (2011)CrossRef Manavizadeh, N., Raissi, F., Soleimani, E.A., Pourfath, M., Selberherr, S.: Performance assessment of nanoscale field-effect diodes. IEEE Trans. Electron Devices 58(8), 2378 (2011)CrossRef
13.
go back to reference Vadizadeh, M.: Dual material gate nanowire field effect diode (DMGNWFED): operating principle and properties. Microelectron. J. 71, 1 (2018)CrossRef Vadizadeh, M.: Dual material gate nanowire field effect diode (DMGNWFED): operating principle and properties. Microelectron. J. 71, 1 (2018)CrossRef
14.
go back to reference Sotoudeh, A., Amirmazlaghani, M.: Graphene-based field effect diode. Superlattices Microstruct. 120, 828 (2018)CrossRef Sotoudeh, A., Amirmazlaghani, M.: Graphene-based field effect diode. Superlattices Microstruct. 120, 828 (2018)CrossRef
15.
go back to reference Touchaei, B.J., Ghafouri, T., Manavizadeh, N., Raissi, F., Zeidabadi, M.A.: Capacitance–resistance modeling of an inverter based on a nanoscale side-contacted field-effect diode with an overshoot suppression approach. J. Comput. Electron. 20(5), 1666 (2021)CrossRef Touchaei, B.J., Ghafouri, T., Manavizadeh, N., Raissi, F., Zeidabadi, M.A.: Capacitance–resistance modeling of an inverter based on a nanoscale side-contacted field-effect diode with an overshoot suppression approach. J. Comput. Electron. 20(5), 1666 (2021)CrossRef
16.
go back to reference Ghafouri, T., Manavizadeh, N.: Design and simulation of high-performance 2: 1 multiplexer based on side-contacted FED. Ain Shams Eng. J. 12(1), 709 (2021)CrossRef Ghafouri, T., Manavizadeh, N.: Design and simulation of high-performance 2: 1 multiplexer based on side-contacted FED. Ain Shams Eng. J. 12(1), 709 (2021)CrossRef
17.
go back to reference Amirmazlaghani, M., Raissi, F.: Memory cell using modified field effect diode. IEICE Electron. Express 6(22), 1582 (2009)CrossRef Amirmazlaghani, M., Raissi, F.: Memory cell using modified field effect diode. IEICE Electron. Express 6(22), 1582 (2009)CrossRef
18.
go back to reference Sharma, T., Bantupalli, S.S., Moorthy, T.K.: Modeling of double-gate field-effect diodes for analog applications. ECS J. Solid State Sci. Technol. 10(10), 101012 (2021)CrossRef Sharma, T., Bantupalli, S.S., Moorthy, T.K.: Modeling of double-gate field-effect diodes for analog applications. ECS J. Solid State Sci. Technol. 10(10), 101012 (2021)CrossRef
19.
go back to reference Yang, Y., Salman, A.A., Ioannou, D.E., Beebe, S.G.: Design and optimization of the SOI field effect diode (FED) for ESD protection. Solid-State Electron. 52(10), 1482 (2008)CrossRef Yang, Y., Salman, A.A., Ioannou, D.E., Beebe, S.G.: Design and optimization of the SOI field effect diode (FED) for ESD protection. Solid-State Electron. 52(10), 1482 (2008)CrossRef
20.
go back to reference Cao, S., Beebe, S.G., Salman, A.A., Pelella, M.M., Chun, J., Dutton, R.W.: Field effect diode for effective CDM ESD protection in 45 nm SOI technology. In: IEEE International Reliability Physics Symposium, p. 594 (2009) Cao, S., Beebe, S.G., Salman, A.A., Pelella, M.M., Chun, J., Dutton, R.W.: Field effect diode for effective CDM ESD protection in 45 nm SOI technology. In: IEEE International Reliability Physics Symposium, p. 594 (2009)
21.
go back to reference Hashemi, S.A., Pourmolla, P., Jit, S.: Double-gate field-effect diode: a novel device for improving digital-and-analog performance. IEEE Trans. Electron Devices 67(1), 18 (2020)CrossRef Hashemi, S.A., Pourmolla, P., Jit, S.: Double-gate field-effect diode: a novel device for improving digital-and-analog performance. IEEE Trans. Electron Devices 67(1), 18 (2020)CrossRef
22.
go back to reference Sharafi, F., Orouji, A.A., Soroosh, M.: The novel structure to enhancement Ion/Ioff ratio based on field effect diode. IEEE Trans. Device Mater. Reliab. 21(3), 389 (2021)CrossRef Sharafi, F., Orouji, A.A., Soroosh, M.: The novel structure to enhancement Ion/Ioff ratio based on field effect diode. IEEE Trans. Device Mater. Reliab. 21(3), 389 (2021)CrossRef
23.
go back to reference Vadizadeh, M., Fathipour, M., Darvish, G.: Silicon on raised insulator field effect diode (SORI-FED) for alleviating scaling problem in FED. Int. J. Mod. Phys. B 28(5), 1450038 (2014)CrossRef Vadizadeh, M., Fathipour, M., Darvish, G.: Silicon on raised insulator field effect diode (SORI-FED) for alleviating scaling problem in FED. Int. J. Mod. Phys. B 28(5), 1450038 (2014)CrossRef
24.
go back to reference Ghoreishi, S.S., Vadizadeh, M., Yousefi, R., Afzalian, A.: Low-power ultradeep-submicrometer junctionless carbon nanotube field-effect diode. IEEE Trans. Electron Devices 69(1), 400 (2022)CrossRef Ghoreishi, S.S., Vadizadeh, M., Yousefi, R., Afzalian, A.: Low-power ultradeep-submicrometer junctionless carbon nanotube field-effect diode. IEEE Trans. Electron Devices 69(1), 400 (2022)CrossRef
25.
go back to reference Guo, J., Javey, A., Dai, H., Lundstrom, M.: Performance analysis and design optimization of near ballistic carbon nanotube field-effect transistors. In: IEDM Technical Digest. IEEE International Electron Devices Meeting, p. 703 (2004) Guo, J., Javey, A., Dai, H., Lundstrom, M.: Performance analysis and design optimization of near ballistic carbon nanotube field-effect transistors. In: IEDM Technical Digest. IEEE International Electron Devices Meeting, p. 703 (2004)
26.
go back to reference Steinbach, B.: Recent Progress in the Boolean Domain, Unabridged Cambridge Scholars Publishing, Newcastle (2014)MATH Steinbach, B.: Recent Progress in the Boolean Domain, Unabridged Cambridge Scholars Publishing, Newcastle (2014)MATH
27.
go back to reference Guo, J.: A quantum-mechanical treatment of phonon scattering in carbon nanotube transistors. J. Appl. Phys. 98(6), 063519 (2005)CrossRef Guo, J.: A quantum-mechanical treatment of phonon scattering in carbon nanotube transistors. J. Appl. Phys. 98(6), 063519 (2005)CrossRef
28.
go back to reference Koswatta, S.O., Hasan, S., Lundstrom, M.S., Anantram, M.P., Nikonov, D.E.: Nonequilibrium green’s function treatment of phonon scattering in carbon-nanotube transistors. IEEE Trans. Electron Devices 54(9), 2339 (2007)CrossRef Koswatta, S.O., Hasan, S., Lundstrom, M.S., Anantram, M.P., Nikonov, D.E.: Nonequilibrium green’s function treatment of phonon scattering in carbon-nanotube transistors. IEEE Trans. Electron Devices 54(9), 2339 (2007)CrossRef
Metadata
Title
A performance evaluation of a novel field-effect device as an alternative to the field-effect diode
Authors
Vahid Khorsand
Reza Yousefi
Seyed Saleh Ghoreishi
Amard Afzalian
Publication date
29-03-2023
Publisher
Springer US
Published in
Journal of Computational Electronics / Issue 3/2023
Print ISSN: 1569-8025
Electronic ISSN: 1572-8137
DOI
https://doi.org/10.1007/s10825-023-02027-7