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Published in: Structural and Multidisciplinary Optimization 2/2011

01-02-2011 | Research Paper

Application of layout and topology optimization using pattern gradation for the conceptual design of buildings

Authors: Lauren L. Stromberg, Alessandro Beghini, William F. Baker, Glaucio H. Paulino

Published in: Structural and Multidisciplinary Optimization | Issue 2/2011

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Abstract

This paper explores the use of manufacturing-type constraints, in particular pattern gradation and repetition, in the context of building layout optimization. By placing constraints on the design domain in terms of number and variable size of repeating patterns along any direction, the conceptual design for buildings is facilitated. To substantiate the potential future applications of this work, examples within the context of high-rise building design are presented. Successful development of such ideas can contribute to practical engineering solutions, especially during the building design process. Examples are given to illustrate the ideas developed both in two-dimensional and three-dimensional building configurations.

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Metadata
Title
Application of layout and topology optimization using pattern gradation for the conceptual design of buildings
Authors
Lauren L. Stromberg
Alessandro Beghini
William F. Baker
Glaucio H. Paulino
Publication date
01-02-2011
Publisher
Springer-Verlag
Published in
Structural and Multidisciplinary Optimization / Issue 2/2011
Print ISSN: 1615-147X
Electronic ISSN: 1615-1488
DOI
https://doi.org/10.1007/s00158-010-0563-1

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