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Technical Physics
Published in: Technical Physics 9/2014

01-09-2014 | Solid State

Chromium mask for plasma-chemical etching of Al x Ga1 − x N layers

Authors: D. Yu. Protasov, N. R. Vitsina, N. A. Valisheva, F. N. Dul’tsev, T. V. Malin, K. S. Zhuravlev

Published in: Technical Physics | Issue 9/2014

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previous article Resonance magnetoelectric effect without a bias field in a piezoelectric langatate-hysteretic ferromagnet monolithic structure
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Metadata
Title
Chromium mask for plasma-chemical etching of Al x Ga1 − x N layers
Authors
D. Yu. Protasov
N. R. Vitsina
N. A. Valisheva
F. N. Dul’tsev
T. V. Malin
K. S. Zhuravlev
Publication date
01-09-2014
Publisher
Pleiades Publishing
Published in
Technical Physics / Issue 9/2014
Print ISSN: 1063-7842
Electronic ISSN: 1090-6525
DOI
https://doi.org/10.1134/S1063784214090242

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