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Journal of Polymer Research
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01-06-2025 | Original Paper

Design and synthesis of radiation-sensitive monomer and polymers for potential application in extreme ultraviolet lithography

Authors: Jingyi Gan, Yuanzhuang Li, Lei Yang, Rui Wang, Chenyu Zheng, Guomin Xiao

Published in: Journal of Polymer Research | Issue 6/2025

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Abstract

The article investigates the development of advanced photoresist materials crucial for extreme ultraviolet (EUV) lithography, a key technology in the semiconductor industry. It focuses on the design and synthesis of radiation-sensitive monomers and polymers, particularly the novel acrylate monomer (4-(acryloxy) phenyl) dimethylsulfonium trifluoromethanate (APDST) and its copolymers. The study emphasizes the importance of these materials in achieving high-resolution patterning and improved line-edge roughness, essential for the next generation of integrated circuit (IC) technology. The characterization of these polymers, including their thermal stability, solubility, and molecular weight distribution, is thoroughly examined. The article also compares the performance of these new materials with existing photoresist polymers, demonstrating their superior properties. The findings suggest that these novel photoresist materials have the potential to overcome current limitations in EUV lithography, paving the way for more efficient and precise semiconductor manufacturing processes.
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Metadata
Title
Design and synthesis of radiation-sensitive monomer and polymers for potential application in extreme ultraviolet lithography
Authors
Jingyi Gan
Yuanzhuang Li
Lei Yang
Rui Wang
Chenyu Zheng
Guomin Xiao
Publication date
01-06-2025
Publisher
Springer Netherlands
Published in
Journal of Polymer Research / Issue 6/2025
Print ISSN: 1022-9760
Electronic ISSN: 1572-8935
DOI
https://doi.org/10.1007/s10965-025-04435-8

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