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Enhancement Mode AlGaN/GaN MISHEMT on Ultra-Wide Band Gap β-Ga2O3 Substrate for RF and Power Electronics

  • 20-03-2024
  • Original Research Article
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Abstract

The article discusses the advantages of using an enhancement mode AlGaN/GaN MISHEMT on a β-Ga2O3 substrate for RF and power electronics applications. It highlights the superior performance of this device in terms of breakdown voltage, low ON-resistance, and high transconductance, making it a promising candidate for high-frequency and high-power applications. The use of β-Ga2O3 as a substrate offers several benefits, including high crystal quality, compatibility with GaN layers, and improved device performance. The article also presents simulation results that validate the proposed device's performance and compare it with existing HEMTs on other substrates. The novel design and superior performance of the proposed MISHEMT make it a standout solution for advanced power electronics and RF applications.

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Title
Enhancement Mode AlGaN/GaN MISHEMT on Ultra-Wide Band Gap β-Ga2O3 Substrate for RF and Power Electronics
Authors
P. Murugapandiyan
Kalva Sri Rama Krishna
A. Revathy
Augustine Fletcher
Publication date
20-03-2024
Publisher
Springer US
Published in
Journal of Electronic Materials / Issue 6/2024
Print ISSN: 0361-5235
Electronic ISSN: 1543-186X
DOI
https://doi.org/10.1007/s11664-024-11005-z
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