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Published in: Journal of Materials Science: Materials in Electronics 2/2020

04-12-2019

Facile fabrication of BiVO4/g-C3N4 photocatalysts and its photocatalytic activity under visible light irradiation

Author: Meina Zhang

Published in: Journal of Materials Science: Materials in Electronics | Issue 2/2020

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Abstract

A series of different percentages of BiVO4/g-C3N4 photocatalysts were synthesized by a simple method. These composite materials were characterized by several characterization techniques. BiVO4/g-C3N4 photocatalytic property was evaluated by RhB degradation experiment under visible light irradiation. The result of experiment indicates that 10 wt% g-C3N4 composite had the best catalytic performance. The composite catalyst’s special structure enhanced the contact region between BiVO4 and g-C3N4 nanocrystals and enhanced the interaction between the chemical bands. g-C3N4 nanocrystals reduce the charge transfer distance, inhibit the photoinduced electron hole pair, and improve the composites photocatalytic activity. The photocatalyst has excellent photocatalytic properties and can degrade almost all of MB and RhB. The experimental results show that the catalyst has good stability and can be reused many times. The photocatalytic mechanism was proved by experiments and elaborated.

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Metadata
Title
Facile fabrication of BiVO4/g-C3N4 photocatalysts and its photocatalytic activity under visible light irradiation
Author
Meina Zhang
Publication date
04-12-2019
Publisher
Springer US
Published in
Journal of Materials Science: Materials in Electronics / Issue 2/2020
Print ISSN: 0957-4522
Electronic ISSN: 1573-482X
DOI
https://doi.org/10.1007/s10854-019-02647-5

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