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Journal of Materials Science: Materials in Electronics

Growth and characterization of hydrophobic anti-reflection CaF2 films

  • 21-07-2020
Published in:
Authors
Ravish K. Jain
Jatinder Kaur
Atul Khanna
Amit K. Chawla
Published in
Journal of Materials Science: Materials in Electronics | Issue 17/2020

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Abstract

CaF2 films of thicknesses in the range of 50–200 nm were deposited by thermal evaporation on glass substrates. A series of CaF2 films were also grown by oblique angle deposition in which the orientation of the substrate with the horizontal direction was varied from 0° to 75°. CaF2 films are crystalline and show X-ray reflections corresponding to (111), (220), and (311) crystal planes of the cubic phase. The surface morphology of the films was analyzed by atomic force microscopy and it is found that surface roughness increases with an increase in the deposition angle. The water contact angle studies on CaF2 films show that the wettability properties of the films depend on the film thickness and hydrophobicity enhances with the angled deposition. Optical studies found that CaF2 films have high transmittance (> 85%) and good anti-reflection properties in the wavelength range of 400–1000 nm. The study shows that the anti-reflection and hydrophobic properties of CaF2 films can be modified by the oblique angle thermal evaporation.

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Title
Growth and characterization of hydrophobic anti-reflection CaF2 films
Authors
Ravish K. Jain
Jatinder Kaur
Atul Khanna
Amit K. Chawla
Publication date
21-07-2020
Publisher
Springer US
Published in
Journal of Materials Science: Materials in Electronics / Issue 17/2020
Print ISSN: 0957-4522
Electronic ISSN: 1573-482X
DOI
https://doi.org/10.1007/s10854-020-03980-w
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