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Published in:
Dimensional Metrology Using Mode-Locked Lasers Read chapter Read first chapter

2019 | OriginalPaper | Chapter

14. In-Process Measurement of Subwavelength Structures

Author : Satoru Takahashi

Published in: Metrology

Publisher: Springer Singapore

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Abstract

This chapter describes in-process measurement of subwavelength structures. Especially, from the viewpoint of affinity with in-process measurement, this chapter focuses on optical measurement, which provides in-process evaluation of engineering microstructure surfaces beyond the diffraction limit. First, application of optical super-resolution using structured light illumination to semiconductor patterns inspection is shown. Second, a new type of optical depth measurement of subwavelength microgrooves using an interference measuring method, which can measure the depth of microgrooves, with widths less than the diffraction limit, is described. Third, as an example of application of near-field optics for in-process measurement for quality of subwavelength structures, nano-thickness inspection of residual layer thickness during nanoimprint lithography is demonstrated. Through concrete examples, the possibility of an optical measurement method for the in-process measurement of subwavelength structures is discussed.

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previous chapter In-Line Measurement Technology and Quality Control
next chapter Optical Scatterometry for Nanostructure Metrology
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Metadata
Title
In-Process Measurement of Subwavelength Structures
Author
Satoru Takahashi
Copyright Year
2019
Publisher
Springer Singapore
Book
Metrology

Print ISBN: 978-981-10-4937-8

Electronic ISBN: 978-981-10-4938-5

Copyright Year: 2019

DOI
https://doi.org/10.1007/978-981-10-4938-5_15

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