Skip to main content
Top

2020 | OriginalPaper | Chapter

Influence of the Growth Temperature on the Properties of the Transparent and Conductive NiO Thin Films Obtained by RF Magnetron Sputtering

Activate our intelligent search to find suitable subject content or patents.

search-config
loading …

Abstract

Transparent and conductive nickel oxide (NiO) thin films were deposited on the glass supports by magnetron pulverization (RF). The NiO thin films were investigated by X-ray diffraction (XRD), scanning electron microscopy (SEM), SEM equipped with X-ray detector-analyzer (EDX), UV-VIS spectroscopy and Hall measurements. XRD revealed that the NiO thin films obtained at different substrate temperatures are textured and possess a cubic crystalline structure. SEM analysis indicates the formation of the crystallites with a granular structure. The EDX spectra of the NiO thin films highlighted the presence of Ni and O as elementary components. With the increase of the substrate temperature from 50 to 450 °C Hall measurements show a decrease of the resistivity of the NiO thin layers due to the increase of the concentration and mobility of the free carriers.

Dont have a licence yet? Then find out more about our products and how to get one now:

Springer Professional "Wirtschaft+Technik"

Online-Abonnement

Mit Springer Professional "Wirtschaft+Technik" erhalten Sie Zugriff auf:

  • über 102.000 Bücher
  • über 537 Zeitschriften

aus folgenden Fachgebieten:

  • Automobil + Motoren
  • Bauwesen + Immobilien
  • Business IT + Informatik
  • Elektrotechnik + Elektronik
  • Energie + Nachhaltigkeit
  • Finance + Banking
  • Management + Führung
  • Marketing + Vertrieb
  • Maschinenbau + Werkstoffe
  • Versicherung + Risiko

Jetzt Wissensvorsprung sichern!

Springer Professional "Technik"

Online-Abonnement

Mit Springer Professional "Technik" erhalten Sie Zugriff auf:

  • über 67.000 Bücher
  • über 390 Zeitschriften

aus folgenden Fachgebieten:

  • Automobil + Motoren
  • Bauwesen + Immobilien
  • Business IT + Informatik
  • Elektrotechnik + Elektronik
  • Energie + Nachhaltigkeit
  • Maschinenbau + Werkstoffe




 

Jetzt Wissensvorsprung sichern!

Literature
1.
go back to reference Sato, H., Minami, T., Tokata, S., Yamada, T.: Thin Solid Films 236, 27–31 (1993)CrossRef Sato, H., Minami, T., Tokata, S., Yamada, T.: Thin Solid Films 236, 27–31 (1993)CrossRef
3.
go back to reference Chen, H.-L., Lu, Y.-M., Wu, J.-Y., Hwang, W.S.: Mater Trans 46(11), 2530–2535 (2005)CrossRef Chen, H.-L., Lu, Y.-M., Wu, J.-Y., Hwang, W.S.: Mater Trans 46(11), 2530–2535 (2005)CrossRef
4.
go back to reference Fujii, E., Tomozawa, A., Torii, H., Takayama, R.: Jpn. J. Appl. Phys. 35, L328–L330 (1996)CrossRef Fujii, E., Tomozawa, A., Torii, H., Takayama, R.: Jpn. J. Appl. Phys. 35, L328–L330 (1996)CrossRef
5.
go back to reference Kitao, M., Izawa, K., Urabe, K., Komatsu, T., Kuwano, S., Yamada, S.: Jpn. J. Appl. Phys. 33, 6656–6662 (1994)CrossRef Kitao, M., Izawa, K., Urabe, K., Komatsu, T., Kuwano, S., Yamada, S.: Jpn. J. Appl. Phys. 33, 6656–6662 (1994)CrossRef
6.
go back to reference Kumagai, H., Matsumoto, M., Toyoda, K., Obara, M.: J. Mater. Sci. Lett. 15, 1081–1083 (1996)CrossRef Kumagai, H., Matsumoto, M., Toyoda, K., Obara, M.: J. Mater. Sci. Lett. 15, 1081–1083 (1996)CrossRef
7.
go back to reference Yang, J., Shi, D.Q., Park, C., Song, K.J., Ko, R.K., Liu, H.Z., Gu, H.W.: Physica C 412–414, 844–847 (2004)CrossRef Yang, J., Shi, D.Q., Park, C., Song, K.J., Ko, R.K., Liu, H.Z., Gu, H.W.: Physica C 412–414, 844–847 (2004)CrossRef
8.
go back to reference Maeda, T., Kim, S.B., Suga, T., Kurosaki, H., Toyotaka, Y., Yamada, Y., Watanabe, T., Matsumoto, K., Hirabayashi, I.: Phys C 357–360, 1042–1045 (2001)CrossRef Maeda, T., Kim, S.B., Suga, T., Kurosaki, H., Toyotaka, Y., Yamada, Y., Watanabe, T., Matsumoto, K., Hirabayashi, I.: Phys C 357–360, 1042–1045 (2001)CrossRef
9.
go back to reference Lee, S.S., Hwang, D.G., Park, C.M., Rhee, J.R. (1997) J. Appl. Phys. 815298–53008; Puspharajah, P., Radhakrishna, S., Arof, A.K.: J. Mater. Sci. 32, 3001–3006 (1997) Lee, S.S., Hwang, D.G., Park, C.M., Rhee, J.R. (1997) J. Appl. Phys. 815298–53008; Puspharajah, P., Radhakrishna, S., Arof, A.K.: J. Mater. Sci. 32, 3001–3006 (1997)
10.
go back to reference Wang, S.Y., Wang, W., Wang, W.Z., Du, Y.W.: Mater. Sci. Eng. B90, 133–137 (2002)CrossRef Wang, S.Y., Wang, W., Wang, W.Z., Du, Y.W.: Mater. Sci. Eng. B90, 133–137 (2002)CrossRef
11.
go back to reference Agrawal, A., Habibi, H.R., Agrawal, R.K., Cronin, J.P., Roberts, D.M., R’Sue, C.P., Lampert, C.M.: Thin Solid Film 221, 239–253 (1992)CrossRef Agrawal, A., Habibi, H.R., Agrawal, R.K., Cronin, J.P., Roberts, D.M., R’Sue, C.P., Lampert, C.M.: Thin Solid Film 221, 239–253 (1992)CrossRef
12.
go back to reference Tanaka, M., Mukai, M., Fujimori, Y., Kondoh, M., Tasaka, Y., Babaand, H., Usami, S.: Thin Solid Films 281–282, 453–456 (1996)CrossRef Tanaka, M., Mukai, M., Fujimori, Y., Kondoh, M., Tasaka, Y., Babaand, H., Usami, S.: Thin Solid Films 281–282, 453–456 (1996)CrossRef
13.
go back to reference Fujii, E., Tomozawa, A., Fujii, S., Torii, H., Hattori, M., Takayama, R.: Jpn. J. Appl. Phys. 32, L1448–L1450 (1993)CrossRef Fujii, E., Tomozawa, A., Fujii, S., Torii, H., Hattori, M., Takayama, R.: Jpn. J. Appl. Phys. 32, L1448–L1450 (1993)CrossRef
14.
go back to reference Patel, K.J., Desai, M.S., Panchal, C.J., Rehani, B.: J. Nano-Electron. Phys. 1, 376–382 (2011) Patel, K.J., Desai, M.S., Panchal, C.J., Rehani, B.: J. Nano-Electron. Phys. 1, 376–382 (2011)
15.
go back to reference Franta, D., Negulescu, B., Thomas, L., Dahoo, P.R., Guyot, M., Ohlidal, I., Mistrik, J., Yamaguchi, T.: J. Appl. Surf. Sci. 244(1–4), 426–430 (2005)CrossRef Franta, D., Negulescu, B., Thomas, L., Dahoo, P.R., Guyot, M., Ohlidal, I., Mistrik, J., Yamaguchi, T.: J. Appl. Surf. Sci. 244(1–4), 426–430 (2005)CrossRef
16.
go back to reference Fujii, E., Tomozawa, A., Torii, H., Takayama, R.: Jpn. J. Appl. Phys. 35, 328–330 (1996)CrossRef Fujii, E., Tomozawa, A., Torii, H., Takayama, R.: Jpn. J. Appl. Phys. 35, 328–330 (1996)CrossRef
17.
go back to reference Xiao, Z.H., Xia, X.F., Xu, S.J., Luo, Y.P., Zhong, W., Ou, H., Jiang, E.S.: ICADME Proceeding 5th International Conference on Advanced Design and Manufacturing Engineering, pp. 827–832 (2015) Xiao, Z.H., Xia, X.F., Xu, S.J., Luo, Y.P., Zhong, W., Ou, H., Jiang, E.S.: ICADME Proceeding 5th International Conference on Advanced Design and Manufacturing Engineering, pp. 827–832 (2015)
18.
go back to reference Samuelraj Visuvasam, A., Dineshababu, N.K.: IJARTET 3(13), 234 (2016) Samuelraj Visuvasam, A., Dineshababu, N.K.: IJARTET 3(13), 234 (2016)
Metadata
Title
Influence of the Growth Temperature on the Properties of the Transparent and Conductive NiO Thin Films Obtained by RF Magnetron Sputtering
Authors
L. Ghimpu
V. Suman
D. Rusnac
Copyright Year
2020
DOI
https://doi.org/10.1007/978-3-030-31866-6_57