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Influence of the process parameters on phase stabilisation and microstructure control of TiO2 thin films for optoelectronic application

  • 01-11-2025
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Abstract

This study delves into the influence of process parameters on the phase stabilization and microstructure control of TiO2 thin films, with a focus on their potential applications in optoelectronic devices. By employing Taguchi's design of experiments, the research systematically evaluates the impact of evaporation time, evaporation temperature, spin-coating speed, and the number of layers on the final quality of nanocrystalline TiO2 films synthesized via the sol-gel process. The investigation reveals that the number of coatings has the most significant influence on the films' properties, while evaporation duration has the least impact. The optimized TiO2 films exhibit a highly crystalline anatase phase, transmittance exceeding 80%, and a crack-free surface. The study also demonstrates the photoconductivity of the optimized films, showcasing their potential as electron transport layers in perovskite solar cells and other optoelectronic applications. The detailed analysis of the films' microstructure, crystallinity, and optical properties provides valuable insights for researchers and engineers working on similar materials.

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Title
Influence of the process parameters on phase stabilisation and microstructure control of TiO2 thin films for optoelectronic application
Authors
Tajamul A. Wani
Sidhanta Gupta
Jay Krishna Anand
Partha Mishra
KM. Sakshi
Neetesh Dhakar
Hemant Kumar Sharma
Soumyendu Roy
Sunil Kumar
Krishna B. Balasubramanian
Ankur Goswami
Publication date
01-11-2025
Publisher
Springer US
Published in
Journal of Materials Science: Materials in Electronics / Issue 33/2025
Print ISSN: 0957-4522
Electronic ISSN: 1573-482X
DOI
https://doi.org/10.1007/s10854-025-16084-0
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