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Investigation of the Electrical Parameters in a Partially Extended Ge-Source Double-Gate Tunnel Field-Effect Transistor (DG-TFET)

  • 26-03-2024
  • Original Research Article
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Abstract

The article explores the electrical parameters of a partially extended Ge-source double-gate tunnel field-effect transistor (PEGeDG-TFET) under the influence of interface trap charges (ITCs) and temperature variations. The study focuses on the reliability and performance of the device for analog/RF and linearity metrics, aiming to ensure its suitability for applications demanding consistent performance. The authors employ a calibrated TCAD simulation framework to analyze the device's characteristics, including drain current, transconductance, and capacitance. They also investigate the impact of device parameters such as drain doping, gate length, and oxide thickness on the device's performance. The findings highlight the PEGeDG-TFET's potential for high-speed and low-power applications, while also addressing the challenges posed by ITCs and temperature variations.

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Title
Investigation of the Electrical Parameters in a Partially Extended Ge-Source Double-Gate Tunnel Field-Effect Transistor (DG-TFET)
Authors
Omendra Kr Singh
Vaithiyanathan Dhandapani
Baljit Kaur
Publication date
26-03-2024
Publisher
Springer US
Published in
Journal of Electronic Materials / Issue 6/2024
Print ISSN: 0361-5235
Electronic ISSN: 1543-186X
DOI
https://doi.org/10.1007/s11664-024-10997-y
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