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2022 | OriginalPaper | Chapter

10. Ion Beam-Assisted Deposition

Author : Bernd Rauschenbach

Published in: Low-Energy Ion Irradiation of Materials

Publisher: Springer International Publishing

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Abstract

In this chapter, the ion beam-assisted deposition (IBAD) method is presented, which is characterized by the deposition of material in high vacuum and the simultaneous bombardment of the surface with hyperthermal or low-energy ions. The individual sub-processes of the layer deposition, such as the generation of the atoms and ions, the transport of the particles through the vacuum and the processes on the surface during the deposition of the atoms under low-energy ion beam irradiation are discussed. The layer growth under ion irradiation is described. In detail, the significance of the ion energy, the temperature and the ion-to-atom arrival ratio for the layer growth is presented. Individual aspects such as epitaxial growth, evolution of topography, grain size, texture, biaxial orientation, mechanical layer stresses, and densification as a result of ion beam-assisted deposition are considered. The explanations and models for these aspects known in the literature are presented and critically discussed. A decisive advantage of IBAD over conventional deposition methods is the controlled fabrication of thin compound films, in particular nitride and oxide films. Examples of the formation of various nitride and oxide layers are presented.

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Metadata
Title
Ion Beam-Assisted Deposition
Author
Bernd Rauschenbach
Copyright Year
2022
Book
Low-Energy Ion Irradiation of Materials

Print ISBN: 978-3-030-97276-9

Electronic ISBN: 978-3-030-97277-6

Copyright Year: 2022

DOI
https://doi.org/10.1007/978-3-030-97277-6_10

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