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2022 | OriginalPaper | Chapter

9. Ion Beam Deposition and Cleaning

Author : Bernd Rauschenbach

Published in: Low-Energy Ion Irradiation of Materials

Publisher: Springer International Publishing

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Abstract

Direct deposition of low-energy ionized atoms or molecules (IBD) onto a substrate has key advantages in terms of controlling layer properties. In general, this technique is based either on the deceleration of high-energy, mass-separated ion beams or the generation of mass-separated, low-energy ion beams. The growth of the layers is primarily determined by the balance between two energy-dependent effects, deposition (sticking of deposited atoms or molecules) and sputtering. Processes such as sputtering, ion reflection, and athermal generation of defects define an energy window for successful deposition of the layers. The application of molecular ions for layer deposition is characterized by the fact that these ions are fragmented above a threshold energy. The potential of IBD with hyperthermal particles can be advantageously used in the synthesis of both stable and metastable phases in the deposited layers. As examples, the deposition of carbon and diamond-like carbon films, epitaxial silicon and germanium films, metal films and also compound films can be mentioned. High-quality thin organic films can be deposited by a specific variant of the IBD technique, the electrospray deposition. This technique, based on soft landing, allows the non-destructive deposition of large organic molecules on the surface of a substrate, when the energy of these molecules is lower than the activation energy for collision induced dissociation. This technique is presented and the deposition of selected organic layers is demonstrated. Finally, a method for cleaning surfaces by low energy ion bombardment is reviewed. It is characterized by the removal of surface contamination, adsorbates or compound layers on the surface without significantly damaging the underlying structure.

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previous chapter Low-Energy Ion Beam Bombardment-Induced Nanostructures
next chapter Ion Beam-Assisted Deposition
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Metadata
Title
Ion Beam Deposition and Cleaning
Author
Bernd Rauschenbach
Copyright Year
2022
Book
Low-Energy Ion Irradiation of Materials

Print ISBN: 978-3-030-97276-9

Electronic ISBN: 978-3-030-97277-6

Copyright Year: 2022

DOI
https://doi.org/10.1007/978-3-030-97277-6_9

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