Issue 9/2003
Content (12 Articles)
Indium-tin oxide/Si contacts with In- and Sn-diffusion barriers in polycrystalline Si thin-film transistor liquid-crystal displays
Hojin Ryu, Jinmo Kang, Younggun Han, Donghwan Kim, James Jungho Pak, Won-Kyu Park, Myoung-Su Yang
Stability of fluorinated parylenes to oxygen reactive-ion etching under aluminum, aluminum oxide, and tantalum nitride overlayers
Jay J. Senkevich, B. Wang, J. B. Fortin, M. C. Nielsen, J. F. McDonald, T. -M. Lu, G. M. Nuesca, G. G. Peterson, S. C. Selbrede, M. T. Weise
Comparative studies of p-type InP layers formed by Zn3As2 and Zn3P2 diffusion
Shiwei Feng, Jun Hu, Yicheng Lu, Boris V. Yakshinskiy, James D. Wynn, Chuni Ghosh
Ta/Au ohmic contacts to n-type ZnO
H. Sheng, N. W. Emanetoglu, S. Muthukumar, B. V. Yakshinskiy, S. Feng, Y. Lu
Effects of solid-state annealing on the interfacial intermetallics between tin-lead solders and copper
Kithva H. Prakash, Thirumany Sritharan
Effects of annealing on the hydrogen concentration and the performance of InGaP/InGaAsN/GaAs heterojunction bipolar transistors
Y. M. Hsin, H. T. Hsu, K. P. Hseuh, W. B. Tang, C. C. Fan, C. H. Wang, C. W. Chen, N. Y. Li
Thin-film reactions during diffusion soldering of Cu/Ti/Si and Au/Cu/Al2O3 with Sn interlayers
M. W. Liang, T. E. Hsieh, S. Y. Chang, T. H. Chuang
Effects of vacuum annealing on electrical properties of GaN contacts
Ippei Fujimoto, Hirokuni Asamizu, Masahiro Shimada, Miki Moriyama, Naoki Shibata, Masanori Murakami
The electrical characteristics of 4H-SiC schottky diodes after inductively coupled plasma etching
N. O. V. Plank, Liudi Jiang, A. M. Gundlach, R. Cheung
Fabrication of ultra-thin strained silicon on insulator
T. S. Drake, C. Ní Chléirigh, M. L. Lee, A. J. Pitera, E. A. Fitzgerald, D. A. Antoniadis, D. H. Anjum, J. Li, R. Hull, N. Klymko, J. L. Hoyt
Structural characterization of thick, high-quality epitaxial Ge on Si substrates grown by low-energy plasma-enhanced chemical vapor deposition
Shawn G. Thomas, Sushil Bharatan, Robert E. Jones, Rainer Thoma, Thomas Zirkle, N. V. Edwards, Ran Liu, Xiang Dong Wang, Qianghua Xie, Carsten Rosenblad, Juergen Ramm, Giovanni Isella, Hans Von Känel
Deep level transient spectroscopy study of electron-irradiated CuInSe2 thin films
Hiroshi Okada, Naoki Fujita, Hae-Seok Lee, Akihiro Wakahara, Akira Yoshida, Takeshi Ohshima, Hisayoshi Itoh