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Published in: Journal of Materials Science: Materials in Electronics 7/2016

17-03-2016

Low-temperature preparation of ZnO thin film by atmospheric mist chemistry vapor deposition for flexible organic solar cells

Authors: Jiang Cheng, Qi Wang, Chengxi Zhang, Xin Yang, Rong Hu, Jiang Huang, Junsheng Yu, Lu Li

Published in: Journal of Materials Science: Materials in Electronics | Issue 7/2016

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Abstract

A low-temperature method for the large-scale growth of ZnO thin films on flexible substrates was realized using a mist chemistry vapor deposition setup. We prepared and analyzed ZnO thin films grown on flexible PET/ITO in the temperatures range of 125–250 °C. The growth of ZnO crystallites was qualitatively investigated with respect to nucleation and substrate temperature. We observed a mixed phase in the ZnO thin films prepared at 125 and 150 °C. We conclude that the optimal substrate temperature for optimal ZnO thin films growth is between 150–200 °C. Our results show that the photovoltaic performance of an organic solar cell (OSC) is strongly dependent on both composition and morphology. To demonstrate its application on flexible organic optoelectronic devices, a large OSC with as-grown ZnO thin film as cathode buffer layer was successfully prepared.

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Metadata
Title
Low-temperature preparation of ZnO thin film by atmospheric mist chemistry vapor deposition for flexible organic solar cells
Authors
Jiang Cheng
Qi Wang
Chengxi Zhang
Xin Yang
Rong Hu
Jiang Huang
Junsheng Yu
Lu Li
Publication date
17-03-2016
Publisher
Springer US
Published in
Journal of Materials Science: Materials in Electronics / Issue 7/2016
Print ISSN: 0957-4522
Electronic ISSN: 1573-482X
DOI
https://doi.org/10.1007/s10854-016-4656-5

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