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Thin Film Deposition by Plasma Beam of a Vacuum Arc with Refractory Anodes Read chapter Read first chapter

2019 | OriginalPaper | Chapter

Mass Transfer Model of Sputtering from Rod-Like Targets for Synthesis of Multielement Nanocoatings

Authors : Yu. O. Kosminska, V. I. Perekrestov

Published in: Advances in Thin Films, Nanostructured Materials, and Coatings

Publisher: Springer Nature Singapore

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Abstract

This work develops the mathematical model that allows calculating element concentration depending on substrate location at low working gas pressures for coatings deposited by new magnetron sputtering device on the basis of hollow cathode and rod-like target. In this work, a target composed of two semicylindrical constituents is considered. As the rod-like target can be made of multiple materials in any geometry, the model can be adjusted for any particular case. The calculations explain the general trend of experimental data behavior.

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previous chapter Microstructure and Mechanical Properties of Multilayered α-AlN/α-BCN Coatings Depending on Flux Density During Target B4C Sputtering
next chapter Self-organized Growth by Sputtering and Other PVD Techniques
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Metadata
Title
Mass Transfer Model of Sputtering from Rod-Like Targets for Synthesis of Multielement Nanocoatings
Authors
Yu. O. Kosminska
V. I. Perekrestov
Copyright Year
2019
Publisher
Springer Nature Singapore
Book
Advances in Thin Films, Nanostructured Materials, and Coatings

Print ISBN: 978-981-13-6132-6

Electronic ISBN: 978-981-13-6133-3

Copyright Year: 2019

DOI
https://doi.org/10.1007/978-981-13-6133-3_6

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