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16. Nitrogen Impurity in Crystalline Silicon

  • 2019
  • OriginalPaper
  • Chapter
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Abstract

This chapter starts with the basic features of nitrogen including the existence of N-related defects, detection and measurements of N content, the solubility, and diffusion of N impurities in silicon materials. From the perspective of photovoltaic application, the nitrogen doping method for Czochralski silicon is then introduced, and the results about the influence of nitrogen impurity on N-O complexes, O-related defects, and mechanical properties are presented. A second focus of this chapter is toward N-related defects in directionally solidified photovoltaic multicrystalline silicon (mc-Si) materials. The existence and distribution of N-related defects, the formation, and influence of silicon nitride precipitates in mc-Si are comprehensively described. Then the results about mc-Si growth in ambient nitrogen are presented as an application to further understand the properties of nitrogen in mc-Si.

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Title
Nitrogen Impurity in Crystalline Silicon
Authors
Shuai Yuan
Deren Yang
Copyright Year
2019
Publisher
Springer Berlin Heidelberg
DOI
https://doi.org/10.1007/978-3-662-56472-1_22
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