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Octahedral modifications by Ga doping in NdNiO3 thin films and its systematic influence on electronic transport

  • 01-12-2025
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Abstract

This study delves into the effects of Ga doping on NdNiO3 thin films, focusing on octahedral modifications and their impact on electronic transport properties. The research highlights the emergence of a new B3g Raman mode around 697 cm⁻¹, attributed to the combined presence of Ni and Ga ions. This mode undergoes a redshift with increasing Ga doping, correlating with the larger ionic radius of Ga³⁺ compared to Ni³⁺. The study also examines the temperature-dependent resistivity of the films, revealing a systematic increase in resistivity and the suppression of the metal-to-insulator transition with higher Ga doping levels. The findings are compared with previous work on Al-doped NdNiO3 thin films, underscoring the role of dopant ionic size in modulating lattice dynamics. The stabilization of the insulating state in Ga-doped NdNiO3 films is closely linked to the appearance of the new B3g phonon mode, highlighting its essential influence on the electronic properties of the system. This research provides valuable insights into the potential applications of Ga-doped NdNiO3 films in optoelectronic devices, such as smart windows and transparent electronic components.

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Title
Octahedral modifications by Ga doping in NdNiO3 thin films and its systematic influence on electronic transport
Authors
Ketan S. Navale
Satyabrata Mandal
Krushna R. Mavani
Publication date
01-12-2025
Publisher
Springer US
Published in
Journal of Materials Science: Materials in Electronics / Issue 34/2025
Print ISSN: 0957-4522
Electronic ISSN: 1573-482X
DOI
https://doi.org/10.1007/s10854-025-16216-6
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