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2022 | OriginalPaper | Chapter

5. Sputtering

Author : Bernd Rauschenbach

Published in: Low-Energy Ion Irradiation of Materials

Publisher: Springer International Publishing

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Abstract

Sputtering techniques are of great importance for both academic research and commercial applications. This chapter summarizes the fundamentals of the sputtering process, especially after low-energy ion bombardment. The theoretical description of the total sputtering yield, and the energy and angular distribution of the sputtered atoms is based on the assumption of a linear cascade regime. The description of the sputtering process in the linear regime according to Sigmund for amorphous materials by means of the Boltzmann transport equation is briefly presented, the energy dependence of the sputtering yield is demonstrated, and the influence of critical parameters, such as surface binding energy, threshold energy and material correction factor is discussed. The dependence of the sputtering yield on the ion incidence angle and also the energy and angular distributions of the sputtered particles are considered in detail. The particular case of preferential sputtering in low-energy ion bombardment of binary materials is addressed, considering both the mass effect and the bonding effect. An important aspect of this chapter is the measurement of the sputtering yield and energy and angular distributions of the sputtered particles. Finally, the reflection of low-energy ions from surfaces is briefly presented.

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Metadata
Title
Sputtering
Author
Bernd Rauschenbach
Copyright Year
2022
Book
Low-Energy Ion Irradiation of Materials

Print ISBN: 978-3-030-97276-9

Electronic ISBN: 978-3-030-97277-6

Copyright Year: 2022

DOI
https://doi.org/10.1007/978-3-030-97277-6_5

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