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Journal of Materials Science: Materials in Electronics
Published in: Journal of Materials Science: Materials in Electronics 9/2016

17-05-2016

The control of surface texture for planar CH3NH3PbI3−xClx film and its effect on photovoltaic performance

Authors: Wenzhen Wang, Haitao Xu, Wenqiang Xu, Yanglin Wu, Runan Cao, Jiabin Zhu, Zebo Fang, Feng Hong, Run Xu, Fei Xu, Linjun Wang, Jian Huang, Yicheng Lu

Published in: Journal of Materials Science: Materials in Electronics | Issue 9/2016

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Abstract

The surface texture with a long alignment was observed on the surface of CH3NH3PbI3−xClx films prepared using one-step solution deposition. We found that it appears only when hydroiodic acid with stabilizer H3PO2 is adopted to prepare CH3NH3I powder. However, even with this stabilizer, the surface texture of CH3NH3PbI3−xClx films can also be eliminated completely by sufficiently lateral diffusion before annealing, which can be achieved by high speed coating above 3000 rpm or drying for 30 min at room temperature. The later process results in a smooth surface with homogeneous grains and hence the improvement of photovoltaic performance.
previous article Influence of Ni on structural, morphological and optical properties of nanocrystalline CdS thin films prepared by chemical bath deposition method
next article Ca(Mg1/3Ta2/3)O3 dielectric thin films: preparation, structure, mechanical and dielectric properties

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Appendix
Available only for authorised users
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Metadata
Title
The control of surface texture for planar CH3NH3PbI3−xClx film and its effect on photovoltaic performance
Authors
Wenzhen Wang
Haitao Xu
Wenqiang Xu
Yanglin Wu
Runan Cao
Jiabin Zhu
Zebo Fang
Feng Hong
Run Xu
Fei Xu
Linjun Wang
Jian Huang
Yicheng Lu
Publication date
17-05-2016
Publisher
Springer US
Published in
Journal of Materials Science: Materials in Electronics / Issue 9/2016
Print ISSN: 0957-4522
Electronic ISSN: 1573-482X
DOI
https://doi.org/10.1007/s10854-016-4981-8

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