2006 | OriginalPaper | Chapter
Two-Dimensional Patterns in High Frequency Plasma Discharges
Authors : D. Mackey, M.M. Turner
Published in: Progress in Industrial Mathematics at ECMI 2004
Publisher: Springer Berlin Heidelberg
Activate our intelligent search to find suitable subject content or patents.
Select sections of text to find matching patents with Artificial Intelligence. powered by
Select sections of text to find additional relevant content using AI-assisted search. powered by
Large area uniform plasmas are essential in microelectronics processing. Motivated by this application, a macroscopic model is proposed as a framework for investigating the occurrence of instabilities in high frequency plasma discharges for parallel plate geometries. This paper will concentrate on the formation of stationary, spatially inhomogeneous patterns.