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Published in:
2007 | OriginalPaper | Chapter
Upcoming Challenges for Process Modeling
Author : P. Pichler
Published in: Simulation of Semiconductor Processes and Devices 2007
Publisher: Springer Vienna
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In industrial environments, numerical simulation has become an indispensable tool for the development and optimization of especially front-end processes. In order to remain useful for future technology nodes, process simulation has to follow and partly even anticipate paradigm shifts of state-of-the-art processes and new materials for future nanoelectronic devices. Within this article, the author presents his personal view of unsolved and upcoming issues that have to be addressed and solved in future.