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2018 | OriginalPaper | Chapter

11. Vacuum Arc with Particle Filtering

Author : Bernd Schultrich

Published in: Tetrahedrally Bonded Amorphous Carbon Films I

Publisher: Springer Berlin Heidelberg

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Abstract

Driving the cathode spots over the target surface by strong external or intrinsic magnetic fields allows to reduce, but not to suppress the emission of target splinters.

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previous chapter Methods of Vacuum Arc Deposition of ta-C Films

next chapter Special Arc Modes with Reduced Macroparticle Emission

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Title: Vacuum Arc with Particle Filtering
Author: Bernd Schultrich
Publisher: Springer Berlin Heidelberg
Book: Tetrahedrally Bonded Amorphous Carbon Films I
Print ISBN: 978-3-662-55925-3

Electronic ISBN: 978-3-662-55927-7

Copyright Year: 2018
DOI: https://doi.org/10.1007/978-3-662-55927-7_11

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