Fabrication of metallic micromirror using electroplating technology

A nickel micromirror array was designed and successfully fabricated using a thick photoresist as a sacrificial layer and as a mold for nickel electroplating. It was composed of two address electrodes, two support posts and a nickel mirror plate. The mirror plate, which is supported by two nickel posts, is overhung about 10 μm from the silicon substrate. The nickel mirror plate is actuated by an electrostatic force generated by electrostatic potential difference applied between the mirror plate and the address electrode. Optimized fabrication processes have been developed to reduce residual stress in mirror plate and prevent contact between the mirror plate and the substrate, which ensure a reasonable flat and smooth micromirror for operation at low actuation voltage.