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Erschienen in: Journal of Materials Science 20/2018

10.07.2018 | Electronic materials

Field effect properties of single-layer MoS2(1−x)Se2x nanosheets produced by a one-step CVD process

verfasst von: Dengxuan Tang, Fang Wang, Baijun Zhang, Yi Li, Yue Li, Yulin Feng, Yemei Han, Jun Ma, Tianling Ren, Kailiang Zhang

Erschienen in: Journal of Materials Science | Ausgabe 20/2018

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Abstract

In recent years, interfacial doping with other atoms, molecules, and nanoparticles in molybdenum disulfide (MoS2) has been proven as a new route to explore the potential application of 2D materials in microelectronical devices. In this paper, we utilized a one-step chemical vapor deposition approach to synthesize monolayer MoS2(1−x)Se2x nanosheets in atmospheric pressure using MoO3, S, and Se powders as precursors. AFM and visible-light microscopy showed that the as-grown nanosheets were single layers, their surface was atomic flat, and the maximum grain size was over 100 μm. XPS characterization demonstrated that the concentration of selenium in MoS2(1−x)Se2x nanosheets was affected by the amount of selenium powder in the doping process. The back-gate FETs were fabricated to investigate the electrical properties of monolayer MoS2(1−x)Se2x nanosheets with different Se contents. The field effect properties of MoS2(1−x)Se2x (x = 0.65) transistors indicated that a moderate mobility was achieved, and ohmic contact was obtained at the interface of the MoS2(1−x)Se2x channel and metal electrodes. Characterization using high-resolution transmission electron microscopy showed that the microstructure of as-grown MoS2(1−x)Se2x (x = 0.65) had a regular hexagonal lattice structure, which revealed that it was a single-crystalline two-dimensional material.

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Metadaten
Titel
Field effect properties of single-layer MoS2(1−x)Se2x nanosheets produced by a one-step CVD process
verfasst von
Dengxuan Tang
Fang Wang
Baijun Zhang
Yi Li
Yue Li
Yulin Feng
Yemei Han
Jun Ma
Tianling Ren
Kailiang Zhang
Publikationsdatum
10.07.2018
Verlag
Springer US
Erschienen in
Journal of Materials Science / Ausgabe 20/2018
Print ISSN: 0022-2461
Elektronische ISSN: 1573-4803
DOI
https://doi.org/10.1007/s10853-018-2617-5

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