1982 | OriginalPaper | Buchkapitel
High Spatial Resolution SIMS Depth Profiling of Cr Dopant in CdSe Thin Film Transistors
verfasst von : J. D. Brown, F. R. Shepherd, W. D. Westwood
Erschienen in: Secondary Ion Mass Spectrometry SIMS III
Verlag: Springer Berlin Heidelberg
Enthalten in: Professional Book Archive
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CdSe thin film transistors (TFTs) whose structure is illustrated in Fig. 1, have been fabricated with Cr source and drain electrodes having separations varying between 5 and 50 µm [1]. The thermal annealing process employed to activate the devices has been shown to cause diffusion of Cr from the electrodes into the CdSe layer in the gap, doping the film [1,2]. Auger electron spectroscopy [2] was unable to determine the detailed Cr distribution in the device. Since the conductivity behaviour of CdSe and other polycrystalline semiconductor TFTs depends critically on the doping level [3,4], an attempt was made to determine the Cr distribution across the source drain gap and throughout the depth of the CdSe film in annealed, operational devices.