Skip to main content
Erschienen in: Journal of Materials Science: Materials in Electronics 12/2019

07.05.2019

III-Nitride-based junction devices round contacts: effect of semiconductor film geometry and characteristics on the capacitance and conductance measurements

verfasst von: Heberto Gómez Pozos, Arturo Maldonado, J. I. Izpura, Elías Muñoz

Erschienen in: Journal of Materials Science: Materials in Electronics | Ausgabe 12/2019

Einloggen

Aktivieren Sie unsere intelligente Suche, um passende Fachinhalte oder Patente zu finden.

search-config
loading …

Abstract

A theoretical model was developed, which allows simulating the capacitance (C) and conductance/frequency (G/f) profiles as a function of operation frequencies for a round Schottky diode, and in terms of a transfer length concept, LT(jω), which depends on the electrical characteristics of AlGaN:Si semiconductor film, dimensions and structure Schottky diode. The (C) and (G/f) measurements were performed by applying a small electrical signal far away and parallel to the planar structure of junction device, due to the impossibility of accessing perpendicularly path, since the AlGaN:Si semiconductor film was deposited over a substrate of high electrical resistivity, just as it happens with the III nitrates materials. The (C) and (G/f) profiles were measured for operating frequencies ranging from 3 kHz to 1 MHz. Comparison of experimental measurements and theoretical model were analyzed. It was found that the structure Schottky and electrical characteristics of film plays an important role as a limiting factor in the (C) and (G/f) measurements at media and high operating frequencies.

Sie haben noch keine Lizenz? Dann Informieren Sie sich jetzt über unsere Produkte:

Springer Professional "Wirtschaft+Technik"

Online-Abonnement

Mit Springer Professional "Wirtschaft+Technik" erhalten Sie Zugriff auf:

  • über 102.000 Bücher
  • über 537 Zeitschriften

aus folgenden Fachgebieten:

  • Automobil + Motoren
  • Bauwesen + Immobilien
  • Business IT + Informatik
  • Elektrotechnik + Elektronik
  • Energie + Nachhaltigkeit
  • Finance + Banking
  • Management + Führung
  • Marketing + Vertrieb
  • Maschinenbau + Werkstoffe
  • Versicherung + Risiko

Jetzt Wissensvorsprung sichern!

Springer Professional "Technik"

Online-Abonnement

Mit Springer Professional "Technik" erhalten Sie Zugriff auf:

  • über 67.000 Bücher
  • über 390 Zeitschriften

aus folgenden Fachgebieten:

  • Automobil + Motoren
  • Bauwesen + Immobilien
  • Business IT + Informatik
  • Elektrotechnik + Elektronik
  • Energie + Nachhaltigkeit
  • Maschinenbau + Werkstoffe




 

Jetzt Wissensvorsprung sichern!

Springer Professional "Wirtschaft"

Online-Abonnement

Mit Springer Professional "Wirtschaft" erhalten Sie Zugriff auf:

  • über 67.000 Bücher
  • über 340 Zeitschriften

aus folgenden Fachgebieten:

  • Bauwesen + Immobilien
  • Business IT + Informatik
  • Finance + Banking
  • Management + Führung
  • Marketing + Vertrieb
  • Versicherung + Risiko




Jetzt Wissensvorsprung sichern!

Literatur
1.
Zurück zum Zitat R. Quay, D. Schwantuschke, E. Ture, F.V. Raay, C. Friesicke, S. Krause, S. Müller, S. Breuer, B. Godejohann, P. Brückner, High-power microwave GaN/AlGaN HEMTs and MMICs on SiC and silicon substrates for modern radio communication. Phys. Status Solidi A 215, 1700655–1700662 (2018)CrossRef R. Quay, D. Schwantuschke, E. Ture, F.V. Raay, C. Friesicke, S. Krause, S. Müller, S. Breuer, B. Godejohann, P. Brückner, High-power microwave GaN/AlGaN HEMTs and MMICs on SiC and silicon substrates for modern radio communication. Phys. Status Solidi A 215, 1700655–1700662 (2018)CrossRef
2.
Zurück zum Zitat S.M. Islam, K. Lee, J. Verma, V. Protasenko, S. Rouvimov, S. Bharadwaj, H. Xing, D. Jena, MBE-grown 232–270 nm deep-UV LEDs using monolayer thin binary GaN/AlN quantum heterostructures. Appl. Phys. Lett. 110, 041108 (2017)CrossRef S.M. Islam, K. Lee, J. Verma, V. Protasenko, S. Rouvimov, S. Bharadwaj, H. Xing, D. Jena, MBE-grown 232–270 nm deep-UV LEDs using monolayer thin binary GaN/AlN quantum heterostructures. Appl. Phys. Lett. 110, 041108 (2017)CrossRef
3.
Zurück zum Zitat C. Skierbiszewski, M. Siekacz, H. Turski, G. Muzioł, M. Sawicka, A. Feduniewicz-Żmuda, G. Cywiński, C. Cheze, S. Grzanka, P. Perlin, P. Wiśniewski, Z.R. Wasilewski, S. Porowski, AlGaN-free laser diodes by plasma-assisted molecular beam epitaxy. Appl. Phys. Express 5, 022104 (2012)CrossRef C. Skierbiszewski, M. Siekacz, H. Turski, G. Muzioł, M. Sawicka, A. Feduniewicz-Żmuda, G. Cywiński, C. Cheze, S. Grzanka, P. Perlin, P. Wiśniewski, Z.R. Wasilewski, S. Porowski, AlGaN-free laser diodes by plasma-assisted molecular beam epitaxy. Appl. Phys. Express 5, 022104 (2012)CrossRef
4.
Zurück zum Zitat S. Keller, Y.-F. Wu, G. Parish, N. Zhang, J.J. Xu, B.P. Keller, S.P. DenBaars, U.K. Mishra, Gallium nitride based high power heterojunction field effect transistor: process development and present status at UCSB. IEEE Trans. Electron Devices 48, 552–559 (2001)CrossRef S. Keller, Y.-F. Wu, G. Parish, N. Zhang, J.J. Xu, B.P. Keller, S.P. DenBaars, U.K. Mishra, Gallium nitride based high power heterojunction field effect transistor: process development and present status at UCSB. IEEE Trans. Electron Devices 48, 552–559 (2001)CrossRef
5.
Zurück zum Zitat S.T. Sheppard, K. Doverspike, W.L. Pribble, S.T. Allen, J.W. Palmour, High power microwave GaN/AlGaN HEMTs on silicon carbide. IEEE Electron Device Lett. 20, 161–163 (1999)CrossRef S.T. Sheppard, K. Doverspike, W.L. Pribble, S.T. Allen, J.W. Palmour, High power microwave GaN/AlGaN HEMTs on silicon carbide. IEEE Electron Device Lett. 20, 161–163 (1999)CrossRef
6.
Zurück zum Zitat S. Ganguly, J. Verma, H. Xing, D. Jena, Plasma MBE growth conditions of AlGaN/GaN high-electron-mobility transistors on silicon and their device characteristics with epitaxially regrown ohmic contacts. Appl. Phys. Express 7, 105501 (2014)CrossRef S. Ganguly, J. Verma, H. Xing, D. Jena, Plasma MBE growth conditions of AlGaN/GaN high-electron-mobility transistors on silicon and their device characteristics with epitaxially regrown ohmic contacts. Appl. Phys. Express 7, 105501 (2014)CrossRef
7.
Zurück zum Zitat S.M. Sze, K. Ng, Physics of Semiconductor Devices, 3rd edn. (Wiley, Hoboken, 2006)CrossRef S.M. Sze, K. Ng, Physics of Semiconductor Devices, 3rd edn. (Wiley, Hoboken, 2006)CrossRef
8.
Zurück zum Zitat J.I. Izpura, Side contact effects on the capacitance properties of junction devices. Application to III-nitrogen structures. Semicond. Sci. Technol. 16, 243–249 (2001)CrossRef J.I. Izpura, Side contact effects on the capacitance properties of junction devices. Application to III-nitrogen structures. Semicond. Sci. Technol. 16, 243–249 (2001)CrossRef
9.
Zurück zum Zitat J.H. O’Connel, M.E. Lee, J. Westraadt, J.A.A. Engelbrecht, Defect characterization of MOCVD grown AlN/AlGaN films on sapphire substrates by TEM and TKD. Physica B 535, 293–298 (2018)CrossRef J.H. O’Connel, M.E. Lee, J. Westraadt, J.A.A. Engelbrecht, Defect characterization of MOCVD grown AlN/AlGaN films on sapphire substrates by TEM and TKD. Physica B 535, 293–298 (2018)CrossRef
10.
Zurück zum Zitat S. Mase, A. Wakejima, T. Egawa, Analysis of carrier trapping and emission in AlGaN/GaN HEMT with bias-controllable field plate. Phys. Status Solidi A 214, 1600840 (2017)CrossRef S. Mase, A. Wakejima, T. Egawa, Analysis of carrier trapping and emission in AlGaN/GaN HEMT with bias-controllable field plate. Phys. Status Solidi A 214, 1600840 (2017)CrossRef
11.
Zurück zum Zitat Y. Zohta, H. Kuroda, R. Nii, S. Nakamura, Frequency dependence of the reverse-biased capacitance of blue and green light-emitting diodes. J. Cryst. Growth 189(190), 816–819 (1998)CrossRef Y. Zohta, H. Kuroda, R. Nii, S. Nakamura, Frequency dependence of the reverse-biased capacitance of blue and green light-emitting diodes. J. Cryst. Growth 189(190), 816–819 (1998)CrossRef
12.
Zurück zum Zitat R.L. Van Meirhaeghe, E.C. Dutoit, F. Cardon, W.P. Gomes, On the application of the Kramers–Kronig relations to problems concerning the frequency dependence of electrode impedance. Electrochim. Acta 20, 995–999 (1975)CrossRef R.L. Van Meirhaeghe, E.C. Dutoit, F. Cardon, W.P. Gomes, On the application of the Kramers–Kronig relations to problems concerning the frequency dependence of electrode impedance. Electrochim. Acta 20, 995–999 (1975)CrossRef
Metadaten
Titel
III-Nitride-based junction devices round contacts: effect of semiconductor film geometry and characteristics on the capacitance and conductance measurements
verfasst von
Heberto Gómez Pozos
Arturo Maldonado
J. I. Izpura
Elías Muñoz
Publikationsdatum
07.05.2019
Verlag
Springer US
Erschienen in
Journal of Materials Science: Materials in Electronics / Ausgabe 12/2019
Print ISSN: 0957-4522
Elektronische ISSN: 1573-482X
DOI
https://doi.org/10.1007/s10854-019-01459-x

Weitere Artikel der Ausgabe 12/2019

Journal of Materials Science: Materials in Electronics 12/2019 Zur Ausgabe

Neuer Inhalt