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Erschienen in:

Open Access 20.03.2017

Integration and High-Temperature Characterization of Ferroelectric Vanadium-Doped Bismuth Titanate Thin Films on Silicon Carbide

Erschienen in: Journal of Electronic Materials | Ausgabe 7/2017

Vorheriger Artikel Thickness Dependent Structural and Dielectric Properties of Calcium Copper Titanate Thin Films Produced by Spin-Coating Method for Microelectronic Devices

Nächster Artikel Systematics of Structural, Phase Stability, and Cohesive Properties of η′-Cu6(Sn,In)5 Compounds Occurring in In-Sn/Cu Solder Joints

Titel: Integration and High-Temperature Characterization of Ferroelectric Vanadium-Doped Bismuth Titanate Thin Films on Silicon Carbide
Publikationsdatum: 20.03.2017
Erschienen in: Journal of Electronic Materials / Ausgabe 7/2017
Print ISSN: 0361-5235
Elektronische ISSN: 1543-186X
DOI: https://doi.org/10.1007/s11664-017-5447-3

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