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2011 | OriginalPaper | Buchkapitel

Ion Beam Sputtering: A Route for Fabrication of Highly Ordered Nanopatterns

verfasst von : Marina Cornejo, Jens Völlner, Bashkim Ziberi, Frank Frost, Bernd Rauschenbach

Erschienen in: Fabrication and Characterization in the Micro-Nano Range

Verlag: Springer Berlin Heidelberg

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Abstract

This chapter focuses on the self-organized pattern formation by ion beam sputtering. A general description and experimental observations are presented, showing the complexity of the processes involved but also its great potential as patterning technique. The main focus is set on the pattern formation on silicon surfaces. It is shown that several experimental parameters are involved in the topography evolution. Namely, the influence of the ion incidence angle, ion energy, fluence, sample manipulation and substrate temperature is discussed. Additionally, evidence of the importance of iron incorporation in the formation of certain features is presented. The possibility of applying this technique to other materials is illustrated with examples on germanium, compounds semiconductor, silica and crystalline metals.

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Vorheriges Kapitel Patterning and Optical Properties of Materials at the Nanoscale

Nächstes Kapitel Three-Dimensional Open Cell Structures: Evaluation and Fabrication by Additive Manufacturing

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Titel: Ion Beam Sputtering: A Route for Fabrication of Highly Ordered Nanopatterns
verfasst von: Marina Cornejo
Jens Völlner
Bashkim Ziberi
Frank Frost
Bernd Rauschenbach
Verlag: Springer Berlin Heidelberg
Buch: Fabrication and Characterization in the Micro-Nano Range
Print ISBN: 978-3-642-17781-1

Electronic ISBN: 978-3-642-17782-8

Copyright-Jahr: 2011
DOI: https://doi.org/10.1007/978-3-642-17782-8_4

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