Ausgabe 10/2011
Failure Analysis in Electronics: An EDFAS Special Issue
Inhalt (10 Artikel)
Innovative methodologies of circuit edit by focused ion beam (FIB) on wafer-level chip-scale-package (WLCSP) devices
Tao-Chi Liu, Chih Chen, Shih-Ting Liu, Ming-Lun Chang, Jandel Lin
Two-photon absorption laser assisted device alteration using continuous wave 1,340 nm laser
Baohua Niu, Patrick Pardy, Jerry Fortier, Mel Ortega, Travis Eiles
Characterization of poly-Si thin-film solar cell functions and parameters with IR optical interaction techniques
M. Boostandoost, F. Friedrich, U. Kerst, C. Boit, S. Gall, Y. Yokoyama
Extending acoustic microscopy for comprehensive failure analysis applications
Sebastian Brand, Peter Czurratis, Peter Hoffrogge, Dorota Temple, Dean Malta, Jason Reed, Matthias Petzold
Disassembly methodology for conducting failure analysis on lithium–ion batteries
Nick Williard, Bhanu Sood, Michael Osterman, Michael Pecht