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Erschienen in: Journal of Coatings Technology and Research 4/2017

25.04.2017

Kinetics of photodegradation and nanoparticle surface accumulation of a nanosilica/epoxy coating exposed to UV light

verfasst von: Hsiang-Chun Hsueh, Deborah S. Jacobs, Justin M. Gorham, Savelas A. Rabb, Lee L. Yu, Chun-Chieh Tien, Tinh Nguyen, Lipiin Sung

Erschienen in: Journal of Coatings Technology and Research | Ausgabe 4/2017

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Abstract

Temperature effect on the kinetics of photodegradation and surface accumulation of nanoparticles in an epoxy nanocoating exposed to ultraviolet light (UV) was investigated. A model epoxy coating containing 5% untreated nanosilica was selected. Exposed film specimens were removed at specified UV dose intervals for measurements of chemical degradation of the epoxy component, and nanosilica accumulation on specimen surface release as a function of UV dose for four temperatures. The chemical degradation was measured using Fourier transform infrared spectroscopy, X-ray photoelectron spectroscopy, and UV–visible spectroscopy. Atomic force microscopy was employed to determine the kinetics of nanosilica accumulation on the nanocoating surface during UV exposure. The temperature dependence behaviors of kinetic parameters obtained by various measurement techniques will be used to better understand the degradation mechanism and surface accumulation of nanoparticles in exterior nanocoatings.

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Metadaten
Titel
Kinetics of photodegradation and nanoparticle surface accumulation of a nanosilica/epoxy coating exposed to UV light
verfasst von
Hsiang-Chun Hsueh
Deborah S. Jacobs
Justin M. Gorham
Savelas A. Rabb
Lee L. Yu
Chun-Chieh Tien
Tinh Nguyen
Lipiin Sung
Publikationsdatum
25.04.2017
Verlag
Springer US
Erschienen in
Journal of Coatings Technology and Research / Ausgabe 4/2017
Print ISSN: 1547-0091
Elektronische ISSN: 1935-3804
DOI
https://doi.org/10.1007/s11998-016-9911-4

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