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Thin film flowing down a curved surface

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Abstract

The film flow down a curved surface is analysed by an orthogonal curvilinear system and a perturbation in the small ratio of film thickness to minimum radius of curvature. General solutions are obtained to second order. The results are applied to plates with exponential curvature and sinusoidal curvature. Separation is most likely to occur on the upstream sides of a wavy plate.

Zusammenfassung

Es wird die Strömung einer dünnen Schicht entlang einer gekrümmten Fläche untersucht, mit Hilfe eines krummlinigen orthogonalen Koordinatensystems und einer Entwicklung, bei dem das Verhältnis von Schichtdicke zu (minimalem) Krümmungsradius als kleiner Parameter dient. Es werden allgemeine Lösungen bis zur zweiten Ordnung angegeben. Die Ergebnisse werden auf Platten mit exponentieller und sinusförmiger Krümmung angewendet. Ablösung wird am wahrscheinlichsten an Stellen stromaufwärts an einer gewellten Platte auftreten.

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Authors and Affiliations

  1. Dept. of Mathematics and Mechanical Engineering, Michigan State University, 48824, East Lansing, Michigan, USA

    C. Y. Wang

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  1. C. Y. Wang
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Wang, C.Y. Thin film flowing down a curved surface. Z. angew. Math. Phys. 35, 532–544 (1984). https://doi.org/10.1007/BF00945073

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  • DOI: https://doi.org/10.1007/BF00945073

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