Abstract
Transparent conducting tin oxide thin films have been prepared by electron beam evaporation and spray pyrolysis methods. Structural, optical and electrical properties were studied under different preparation conditions like substrate temperature, solution flow rate and rate of deposition. Resistivity of undoped evaporated films varied from 2.65 × 10−2 ω-cm to 3.57 × 10−3 ω-cm in the temperature range 150–200°C. For undoped spray pyrolyzed films, the resistivity was observed to be in the range 1.2 × 10−1 to 1.69 × 10−2 ω-cm in the temperature range 250–370° C. Hall effect measurements indicated that the mobility as well as carrier concentration of evaporated films were greater than that of spray deposited films. The lowest resistivity for antimony doped tin oxide film was found to be 7.74 × 10−4 ω-cm, which was deposited at 350°C with 0.26 g of SbCl3 and 4 g of SnCl4 (SbCl3/SnCl4 = 0.065).
Evaporated films were found to be amorphous in the temperature range up to 200°C, whereas spray pyrolyzed films prepared at substrate temperature of 300– 370°C were poly crystalline. The morphology of tin oxide films was studied using SEM.
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References
Ansari S G, Gosavi S W, Gangal S A, Karekar R N and Aiyer R C 1997J. Mater. Sci. Mater. Electron. 8 23
Bernarti M I B, Soledade L E, Santos E R, Leite I A, Longo E and Valela J A 2002Thin Solid Films 405 228
Brinzari V, Korotcenkov G and Golovanov V 2001Thin Solid Films 391 167
Colen S 1981Thin Solid Films 77 127
Das Debajyoti and Banerjee Ratnabali 1987Thin Solid Films 147 321
Fantini M 1986J. Cryst. Growth 74 439
Frank G, Kaur E and Kostlin H 1983Solar Energy Matter 8 387
Goetzberger A and Hebling C 2000Sol. Energy Mater. and Solar Cells 62 1
Jarzebski Z M 1982Phys. Status Solidi (a)71 13
Jagadish C, Dawar A L, Sangay Sharma, Shishodia P K, Tripathi K N and Mathur P C 1988Mater. Lett. 6 149
Kulaszewicz S 1980Thin Solid Films 74 211
Kulaszewicz S, Lasocka I and Michalski C Z 1983Thin Solid Films 55 283
Lousa A, Gimeno S and Marti J 1994Vacuum 45 1143
Lou J C, Lin M S, Chyi J I and Shieh J H 1983Thin Solid Films 106 163
Melsheimer J and Tesche B 1986Thin Solid Films 138 71
Minami Tadatsugu, Hidehito, Hidechito Nanto and Takata Shinzo 1988Jap. J. Appl. Phys. 27 L-28
Nomura K, Ujihira Y and Sharma S S 1989J. Mater. Sci. 24 937
Rao K S R K and Murthy L C S 1999Bull. Mater. Sci. 22 953
Schroder Dieterk 1990Superconducting material and device characterization (New York: John Wiley and Sons Inc)
Shanthi E, Banerjee A, Dutta V and Chopra K L 1980Thin Solid Films 71 237
Swanepoel R 1983J. Phys. E16 1214
Thangaraju B 2002Thin Solid Films 402 71
Van Heerden J L and Swanepoel R 1997Thin Solid Films 299 72
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Shamala, K.S., Murthy, L.C.S. & Narasimha Rao, K. Studies on tin oxide films prepared by electron beam evaporation and spray pyrolysis methods. Bull Mater Sci 27, 295–301 (2004). https://doi.org/10.1007/BF02708520
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DOI: https://doi.org/10.1007/BF02708520