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Optimized design of an all-optical XOR gate with high contrast ratio and ultra-compact dimensions

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Abstract

In this work, an optimized structure for an all-optical XOR gate with high contrast ratio and extremely compact dimension is proposed based on a photonic crystal platform. The above structure employs silicon rods in a hexagonal lattice configuration. The design works purely on linear interference effect between the incoming light signals without utilizing any non-linear materials. To study the propagation of light within the structure and to generate the bandgap diagram, the Finite Difference Time Domain technique and Plane Wave Expansion methods are utilized. After optimization of the various design parameters, a contrast ratio of 31.76 dB is attained by the proposed structure along with a response time of 0.46 ps and a footprint of 42.24 μm2. The device can be operated in the C Band with optimum performance at 1550 nm, which is the telecommunication wavelength. The operating bit rate for the proposed structure is 2.17 Tbps. The all-optical XOR gate plays a crucial role as the building blocks of various sequential and combinational logic designs suitable for application in optical computing and telecommunication systems.

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  1. Department of Electronics and Communication Engineering, National Institute of Technology, Tiruchirappalli, 620015, Tamil Nadu, India

    E. G. Anagha & R. K. Jeyachitra

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  1. E. G. Anagha
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Anagha, E.G., Jeyachitra, R.K. Optimized design of an all-optical XOR gate with high contrast ratio and ultra-compact dimensions. Appl. Phys. B 128, 21 (2022). https://doi.org/10.1007/s00340-021-07747-x

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