Abstract
The states of oxidation of molybdenum, tungsten, niobium, and tantalum in thin oxide films of variable composition were determined by X-ray photoelectron spectroscopy. It was found that the metals occurred in different states of oxidation in thin oxide films prepared by the irradiation of metal surfaces with low-energy oxygen ions under high-vacuum conditions. The concentrations of metals in different states of oxidation essentially depend on the radiation dose and the reactivity of metals.
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Translated from Zhurnal Analiticheskoi Khimii, Vol. 60, No. 5, 2005, pp. 490–494.
Original Russian Text Copyright © 2005 by Alov.
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Alov, N.V. Determination of the States of Oxidation of Metals in Thin Oxide Films by X-Ray Photoelectron Spectroscopy. J Anal Chem 60, 431–435 (2005). https://doi.org/10.1007/s10809-005-0114-x
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DOI: https://doi.org/10.1007/s10809-005-0114-x