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Structure–Property Relationship of Thin Plasma Deposited Poly(allyl alcohol) Films

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Abstract

Poly(allyl alcohol) films with a thickness of about 150 nm were deposited by pulse plasma polymerization onto different substrates (inorganic and organic). The structure/property relationships of these samples were studied in dependence on the duty cycle (DC) of the plasma by a broad combination of different techniques and probes. For the first time volume sensitive methods (FTIR and dielectric spectroscopy) are combined with surface analytics by employing XPS for that system. FTIR spectroscopy gives qualitatively the same dependence of the concentration of the OH groups on DC like XPS. The observed differences are discussed considering the different analytical depths of both the methods. The dielectric measurements show that the plasma deposited films are not thermally stable but undergo a post plasma chemical reaction during heating. The results obtained by dielectric spectroscopy are discussed in detail with the data from FTIR and XPS measurements.

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Acknowledgments

A. Fahmy gratefully acknowledges the Egyptian Government’s Ministry of Higher Education, Cultural Affairs & Missions Sector (CAMS) for their support and funding. G. Hidde, D. Neubert and F. Milczewski is thanked for technical assistances.

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Authors and Affiliations

  1. BAM Federal Institute for Materials Research and Testing, Unter den Eichen 87, 12200, Berlin, Germany

    A. Fahmy, R. Mix, A. Schönhals & J. F. Friedrich

  2. Department of Chemistry, Faculty of Science, Al Azhar University, Al Mokheim Al Daaem street, Nasr City, Cairo, Egypt

    A. Fahmy

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  1. A. Fahmy
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  2. R. Mix
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  3. A. Schönhals
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  4. J. F. Friedrich
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Correspondence to A. Fahmy.

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Fahmy, A., Mix, R., Schönhals, A. et al. Structure–Property Relationship of Thin Plasma Deposited Poly(allyl alcohol) Films. Plasma Chem Plasma Process 31, 477–498 (2011). https://doi.org/10.1007/s11090-011-9297-0

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  • DOI: https://doi.org/10.1007/s11090-011-9297-0

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